SCHEMBL6585576

SCHEMBL6585576

[CH2]CCCC=C1CCCC1

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
DPP7 Q9UHL4 2/20 0.33
ABCB1 P08183 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25312166 0.98 DPP7 (0.36) DPP7ABCB1
SCHEMBL6591766 0.98 DPP7 (0.36) DPP7ABCB1
SCHEMBL6593927 0.98 DPP7 (0.36) DPP7ABCB1
SCHEMBL25311609 0.98 DPP7 (0.36) DPP7ABCB1
SCHEMBL6593953 0.98 DPP7 (0.36) DPP7ABCB1
SCHEMBL919351 0.95
SCHEMBL29017514 0.93 DPP7 (0.32) DPP7ABCB1
SCHEMBL29017513 0.91 DPP7 (0.31) DPP7ABCB1
SCHEMBL29017509 0.91 DPP7 (0.31) DPP7ABCB1
SCHEMBL919274 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117999296-A Composition and photosensitive composition 东京应化工业株式会社 2024-05-07 CN disclosed
CN-117980347-A Photosensitive composition 东京应化工业株式会社 2024-05-03 CN disclosed
CN-117980346-A Composition and photosensitive composition 东京应化工业株式会社 2024-05-03 CN disclosed
CN-117908327-A Composition and photosensitive composition 东京应化工业株式会社 2024-04-19 CN disclosed
CN-117908326-A Photosensitive composition 东京应化工业株式会社 2024-04-19 CN disclosed
CN-109283792-B Photosensitive composition, pattern forming method, cured product and display device 东京应化工业株式会社 2024-03-22 CN disclosed
CN-107976867-B Photosensitive composition and method for forming cured film 东京应化工业株式会社 2024-03-01 CN disclosed
CN-114761497-B Photosensitive ink composition, cured product, display panel, and method for producing cured product 东京应化工业株式会社 2024-02-20 CN disclosed
CN-117471850-A Photosensitive composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2024-01-30 CN disclosed
CN-111205648-B Curable composition, cured product, microlens, and optical element 东京应化工业株式会社 2023-12-08 CN disclosed
CN-109426079-B Photosensitive composition, cured product forming method, cured product, panel for image display device, and image display device 东京应化工业株式会社 2023-09-19 CN disclosed
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-107643654-B Photosensitive resin composition, cured film, color filter, and method for producing cured film 东京应化工业株式会社 2023-07-07 CN disclosed
CN-114761498-B Photosensitive ink composition, cured product, display panel, and method for producing cured product 东京应化工业株式会社 2023-06-23 CN disclosed
EP-0823423-B1 1,4-DISUBSTITUTED PIPERIDINE DERIVATIVES BANYU PHARMA CO LTD (JP) 2004-06-16 EP disclosed
US-6040449-A USEFUL FOR FORMING FLUORINE CONTAINING 1,4-DISUBSTITUTED PIPERIDINE DERIVATIVES, USEFUL AS ANTAGONIST FOR MUSCARINIC M3 RECEPTORS AND LESS SIDE EFFECT BANYU PHARMACEUTICAL CO LTD (JP) 2000-03-21 US disclosed
US-5948792-A POTENT AND SELECTIVE ANTAGONISTS FOR MUSCARINIC M.SUB.3 RECEPTORS WITH LITTLE SIDE EFFECTS. BANYU PHARMACEUTICAL CO., LTD. (JP) 1999-09-07 US disclosed
EP-0930298-A1 FLUORINATED 1,4-DISUBSTITUTED PIPERIDINE DERIVATIVES BANYU PHARMACEUTICAL CO., LTD. (JP) 1999-07-21 EP disclosed
US-5750540-A SIDE EFFECT REDUCTION BANYU PHARMACEUTICAL CO., LTD. (JP) 1998-05-12 US disclosed
EP-0823423-A1 1,4-DISUBSTITUTED PIPERIDINE DERIVATIVES BANYU PHARMACEUTICAL CO., LTD. (JP) 1998-02-11 EP disclosed