SCHEMBL6620949

SCHEMBL6620949

O=S(=O)([O-])OS(=O)(=O)O[O-].[Rb+].[Rb+]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21906 0.94 MEN1 (0.32)
SCHEMBL2785791 0.94
SCHEMBL11268942 0.94
Potassium Ion SCHEMBL35667 0.94
SCHEMBL7132259 0.94
SCHEMBL6695992 0.94
SCHEMBL7135981 0.94
Silver SCHEMBL5460379 0.94
Lithium Ion SCHEMBL909415 0.94
SCHEMBL6618359 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0985664-B1 Method of producing pyrrolidine derivatives TORAY FINECHEMICALS CO LTD (JP) 2004-03-31 EP disclosed
US-6479668-B1 Method of producing pyrrolidine derivatives TORAY INDUSTRIES, INC. (JP) 2002-11-12 US disclosed
US-6472079-B2 PRODUCT OF HYDROLYSIS AND CONDENSATION OF AN ORGANOSILICON COMPOUND; 1A OR 2A COMPOUND, ESPECIALLY CARBOXYLIC SALT; SOLVENT; EXCELLENT CRACKING RESISTANCE AFTER A PCT (PRESSURE COOKER TEST). JSR CORPORATION (JP) 2002-10-29 US disclosed
US-20020045693-A1 Composition for film formation, method of film formation and silica-based film JSR CORPORATION (JP) 2002-04-18 US disclosed
EP-1148105-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-10-24 EP disclosed
US-6130338-A OXIDATING THE CORRESPONDING 3-PYRROLINE COMPOUND TO GIVE AN EPOXYPYRROLIDINE COMPOUND TORAY INDUSTRIES, INC. (JP) 2000-10-10 US disclosed
EP-0985664-A2 Method of producing pyrrolidine derivatives TORAY INDUSTRIES, INC. (JP) 2000-03-15 EP disclosed
US-4213784-A Process for producing heat developable light-sensitive compositions and elements FUJI PHOTO FILM CO., LTD. (JP) 1980-07-22 US disclosed