⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL312199 | 0.70 | — | — | |
| SCHEMBL8143409 | 0.70 | — | — | |
| SCHEMBL713885 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL6355201 | 0.69 | — | — | |
| SCHEMBL8090477 | 0.67 | — | — | |
| SCHEMBL1097486 | 0.61 | — | — | |
| SCHEMBL6256382 | 0.61 | KCNN4 (0.34) | — | |
| SCHEMBL12815653 | 0.61 | — | — | |
| SCHEMBL1053159 | 0.61 | — | — | |
| SCHEMBL813727 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200339446-A1 | COMPRESSIBLE FOAM ELECTRODE | UCHICAGO ARGONNE, LLC (US) | 2020-10-29 | — | — | US | claimed |
| US-20120046421-A1 | Ordered Nanoscale Domains by Infiltration of Block Copolymers | UCHICAGO ARGONNE, LLC | 2012-02-23 | — | — | US | claimed |
| US-20260077458-A1 | METHODS AND SYSTEMS FOR DEPOSITION TO GAPS USING AN INHIBITOR | ASM IP HOLDING BV (NL) | 2026-03-19 | — | — | US | disclosed |
| US-12571093-B2 | Selective deposition of silicon oxide on metal surfaces | ASM IP HOLDING B.V. (NL) | 2026-03-10 | — | — | US | disclosed |
| US-12492472-B2 | Methods for depositing material within a gap using an inhibitor | ASM IP HOLDING B.V. (NL) | 2025-12-09 | — | — | US | disclosed |
| US-20250069883-A1 | SELECTIVE DEPOSITION OF OXIDE MATERIAL AND A DEPOSITION ASSEMBLY | ASM IP HOLDING B.V. (NL) | 2025-02-27 | — | — | US | disclosed |
| US-12227835-B2 | Selective deposition of material comprising silicon and oxygen using plasma | ASM IP HOLDING B.V. (NL) | 2025-02-18 | — | — | US | disclosed |
| US-12080548-B2 | Selective deposition using hydrophobic precursors | ASM IP HOLDING B.V. (NL) | 2024-09-03 | — | — | US | disclosed |
| US-20240076775-A1 | SELECTIVE DEPOSITION OF SILICON OXIDE ON METAL SURFACES | ASM IP HOLDING B.V. (NL) | 2024-03-07 | — | — | US | disclosed |
| US-11915929-B2 | Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface | ASM IP HOLDING B.V. (NL) | 2024-02-27 | — | — | US | disclosed |
| US-11898240-B2 | Selective deposition of silicon oxide on dielectric surfaces relative to metal surfaces | ASM IP HOLDING B.V. (NL) | 2024-02-13 | — | — | US | disclosed |
| US-20210301392-A1 | SELECTIVE DEPOSITION OF SILICON OXIDE ON DIELECTRIC SURFACES RELATIVE TO METAL SURFACES | ASM IP HOLDING B.V. (NL) | 2021-09-30 | — | — | US | disclosed |
| US-20210159077-A1 | METHODS FOR SELECTIVELY FORMING A TARGET FILM ON A SUBSTRATE COMPRISING A FIRST DIELECTRIC SURFACE AND A SECOND METALLIC SURFACE | ASM IP HOLDING B.V. (NL) | 2021-05-27 | — | — | US | disclosed |
| US-20210005450-A1 | METHODS FOR DEPOSITING A TRANSITION METAL CHALCOGENIDE FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS | ASM IP HOLDING B.V. (NL) | 2021-01-07 | — | — | US | disclosed |
| US-10847366-B2 | Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process | ASM IP HOLDING B.V. (NL) | 2020-11-24 | — | — | US | disclosed |
| US-20200339446-A1 | COMPRESSIBLE FOAM ELECTRODE | UCHICAGO ARGONNE, LLC (US) | 2020-10-29 | — | — | US | disclosed |
| US-10755942-B2 | Method of forming topcoat for patterning | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2020-08-25 | — | — | US | disclosed |
| US-20200161129-A1 | METHODS FOR DEPOSITING A TRANSITION METAL CHALCOGENIDE FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS | ASM IP HOLDING B.V. (NL) | 2020-05-21 | — | — | US | disclosed |
| US-20180122648-A1 | Method of Forming Topcoat for Patterning | NATIONAL SCIENCE FOUNDATION | 2018-05-03 | — | — | US | disclosed |
| US-20170323776-A1 | SELECTIVE DEPOSITION USING HYDROPHOBIC PRECURSORS | ASM IP HOLDING B.V. (NL) | 2017-11-09 | — | — | US | disclosed |