SCHEMBL6640732

SCHEMBL6640732

O=Cc1cc(-c2ccc(O)cc2)ccc1O

nearest known ligand 0.70

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ERN1 O75460 18/20 0.70
PELI1 Q96FA3 1/20 0.58
ALOX5 P09917 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29682880 0.91 ERN1 (0.74) ERN1
SCHEMBL24086095 0.91 ERN1 (0.74) ERN1
SCHEMBL30554384 0.87 ERN1 (0.69) ERN1
SCHEMBL30554383 0.87 ERN1 (0.69) ERN1
SCHEMBL29751505 0.87 ERN1 (0.69) ERN1
SCHEMBL26606756 0.87 ERN1 (0.69) ERN1
SCHEMBL1711118 0.86 ERN1 (0.71) ERN1ALOX5
SCHEMBL30362773 0.86 ERN1 (0.71) ERN1ALOX5
SCHEMBL6638868 0.85 ERN1 (0.67) ERN1
Hydroquinone SCHEMBL11562733 0.85 ERN1 (0.59) ERN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10633353-B2 Polymerizable compound, composition, polymer, optically anisotropic body, liquid crystal display element, and organic EL display DIC CORPORATION (JP) 2020-04-28 US disclosed
EP-2476713-B1 Resist underlayer film composition and patterning process using the same SHINETSU CHEMICAL CO (JP) 2018-04-11 EP disclosed
US-20170260150-A1 POLYMERIZABLE COMPOUND, COMPOSITION, POLYMER, OPTICALLY ANISOTROPIC BODY, LIQUID CRYSTAL DISPLAY ELEMENT, AND ORGANIC EL DEVICE DIC CORPORATION (JP) 2017-09-14 US disclosed
US-20170260150-A1 POLYMERIZABLE COMPOUND, COMPOSITION, POLYMER, OPTICALLY ANISOTROPIC BODY, LIQUID CRYSTAL DISPLAY ELEMENT, AND ORGANIC EL DEVICE DIC CORPORATION (JP) 2017-09-14 US disclosed
US-9230827-B2 Method for forming a resist under layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-05 US disclosed
US-9230827-B2 Method for forming a resist under layer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-05 US disclosed
US-9046764-B2 Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-02 US disclosed
US-9046764-B2 Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-02 US disclosed
EP-2816409-A1 Method for forming a resist under layer film and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2014-12-24 EP disclosed
US-20140335692-A1 METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-13 US disclosed
US-8853031-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-07 US disclosed
US-20130171569-A1 RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-07-04 US disclosed
US-20130171569-A1 RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-07-04 US disclosed
US-20120184103-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20120184103-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
EP-2476713-A1 Resist underlayer film composition and patterning process using the same Shin-Etsu Chemical Co., Ltd. (JP) 2012-07-18 EP disclosed
EP-1412327-A2 INHIBITORS OF PROTEIN KINASE FOR THE TREATMENT OF DISEASE LG Biomedical Institute (US) 2004-04-28 EP disclosed
US-20030208067-A1 Inhibitors of protein kinase for the treatment of disease LG BIOMEDICAL INSTITUTE 2003-11-06 US disclosed
US-20030187007-A1 Inhibitors of protein kinase for the treatment of disease LG BIOMEDICAL INSTITUTE 2003-10-02 US disclosed
WO-2002096867-A2 INHIBITORS OF PROTEIN KINASE FOR THE TREATMENT OF DISEASE LG BIOMEDICAL INSTITUTE (US) 2002-12-05 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170260150-A1 POLYMERIZABLE COMPOUND, COMPOSITION, POLYMER, OPTICALLY ANISOTROPIC BODY, LIQUID CRYSTAL DISPLAY ELEMENT, AND ORGANIC EL DEVICE RPL19, RPL24, RPL29 ERN1 227/4885PELI1 41/4885ALOX5 118/4885
US-10633353-B2 Polymerizable compound, composition, polymer, optically anisotropic body, liquid crystal display element, and organic EL display RPL19, RPL24, RPL29 ERN1 360/4885PELI1 36/4885ALOX5 172/4885
US-20030208067-A1 Inhibitors of protein kinase for the treatment of disease MAP3K20, MAP3K1, MAP3K2 ERN1 446/4885PELI1 1219/4885ALOX5 3275/4885
US-20030187007-A1 Inhibitors of protein kinase for the treatment of disease MAP3K20, MAP3K1, MAP3K2 ERN1 446/4885PELI1 1219/4885ALOX5 3275/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.