Fluoride Ion

Fluoride Ion

SCHEMBL665677

[F-].[F-].[F-].[F-].[F-].[F-].[Mo+6]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL11416849 0.82
Fluoride Ion SCHEMBL8828956 0.82
Fluoride SCHEMBL9753760 0.82 CA4 (0.33)
Hydrazine SCHEMBL27553268 0.71
SCHEMBL27427293 0.71
SCHEMBL2701509 0.71
Fluoride Ion SCHEMBL22981870 0.50
Fluoride Ion SCHEMBL673374 0.50
Fluoride Ion SCHEMBL2030259 0.50
Fluoride Ion SCHEMBL21829535 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2578 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12635434-B2 High aspect ratio contact etching with additive gas TOKYO ELECTRON LIMITED (JP) 2026-05-19 US claimed
WO-2026101809-A1 MOLYBDENUM LINER DEPOSITION LAM RESEARCH CORPORATION (US) 2026-05-15 WO claimed
US-12624445-B2 Method for removing molybdenum monofluoride to molybdenum pentafluoride and method for producing semiconductor device CENTRAL GLASS CO., LTD. (JP) 2026-05-12 US claimed
WO-2026090013-A1 ETCHING OF MOLYBDENUM LAM RESEARCH CORPORATION (US) 2026-04-30 WO claimed
US-12571100-B2 Atomic layer deposition of molybdenum silicide thin films APPLIED MATERIALS, INC. (US) 2026-03-10 US claimed
US-20260068643-A1 SEMICONDUCTOR DEVICE AND METHODS OF FORMATION TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2026-03-05 US claimed
CN-121587107-A Etching method and plasma processing apparatus 东京毅力科创株式会社 2026-02-27 CN claimed
US-20260060020-A1 ETCHING METHOD AND PLASMA PROCESSING APPARATUS TOKYO ELECTRON LIMITED (JP) 2026-02-26 US claimed
US-12540113-B2 Method of producing carboxylic acid fluoride KANTO DENKA KOGYO CO., LTD. (JP) 2026-02-03 US claimed
WO-2025264711-A1 MOLYBDENUM DEPOSITION LAM RESEARCH CORPORATION (US) 2025-12-26 WO claimed
US-4265982-A VAPOR DEPOSITION OF METALS IN A FLUIDIZED BED THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) 1981-05-05 US claimed
EP-0024128-A2 Phosphorylation process IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1981-02-25 EP claimed
US-4241591-A Air conditioning system employing dual cycle THE ROVAC CORPORATION (US) 1980-12-30 US claimed
US-RE30430-E Catalyst treatment DENKA CHEMICAL CORPORATION (US) 1980-11-04 US claimed
US-4172159-A INPINGEMENT OF ORGANOTIN COMPOUND SAINT-GOBAIN INDUSTRIES (FR) 1979-10-23 US claimed
US-4130594-A Liquid phase fluorination process HOOKER CHEMICALS & PLASTICS CORP. (US) 1978-12-19 US claimed
US-4006168-A Catalyst treatment PETRO-TEX CHEMICAL CORPORATION (US) 1977-02-01 US claimed
US-3959234-A CATALYSTS OF ORGANOALUMINUM COMPOUNDS AND A TUNGSTEN OR MOLYBDENUM COMPOUND, RING-OPENING SHOWA DENKO KABUSHIKI KAISHA (JA) 1976-05-25 US claimed
US-3933931-A PERFLUOROETHYL IODIDE FROM IODINE, IODINE PENTAFLUORIDE AND TETRAFLUOROETHYLENE, NIOBIUM, TANTALUM, MOLYBDENUM OR BORON FLUORIDE CATALYST ASAHI GLASS CO., LTD. (JA) 1976-01-20 US claimed
US-3931324-A FROM A 1,1-BIS(HYDROCARBYLPEROXY) CYCLOALKANE AND CYCLOALKANONE, MOLYBDENUM CONTAINING CATALYST ATLANTIC RICHFIELD COMPANY (US) 1976-01-06 US claimed