⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5831479 | 0.83 | — | — | |
| SCHEMBL11861717 | 0.81 | — | — | |
| SCHEMBL27082418 | 0.76 | TSHR (0.40) | — | |
| SCHEMBL375038 | 0.74 | TSHR (0.36) | — | |
| SCHEMBL11862958 | 0.73 | — | — | |
| SCHEMBL8025698 | 0.73 | TSHR (0.32) | — | |
| SCHEMBL8846747 | 0.67 | — | — | |
| SCHEMBL10708301 | 0.67 | TSHR (0.36) | — | |
| SCHEMBL5685680 | 0.67 | TSHR (0.36) | — | |
| SCHEMBL43868 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12215074-B2 | Process for the production of peroxyesters | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2025-02-04 | — | — | US | disclosed |
| CN-114008018-B | Method for producing peroxyesters | 诺力昂化学品国际有限公司 | 2023-09-15 | — | — | CN | disclosed |
| EP-3983380-B1 | PROCESS FOR THE PRODUCTION OF PEROXYESTERS | NOURYON CHEMICALS INT BV (NL) | 2023-08-02 | — | — | EP | disclosed |
| US-20220235001-A1 | PROCESS FOR THE PRODUCTION OF PEROXYESTERS | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2022-07-28 | — | — | US | disclosed |
| EP-3983380-A1 | PROCESS FOR THE PRODUCTION OF PEROXYESTERS | Nouryon Chemicals International B.V. (NL) | 2022-04-20 | — | — | EP | disclosed |
| WO-2014007361-A1 | METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2014-01-09 | — | — | WO | disclosed |
| WO-2013154210-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-10-17 | — | — | WO | disclosed |
| WO-2013147286-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-10-03 | — | — | WO | disclosed |
| WO-2013141395-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-09-26 | — | — | WO | disclosed |
| WO-2013125733-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-08-29 | — | — | WO | disclosed |
| WO-2013100189-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-07-04 | — | — | WO | disclosed |
| WO-2013062133-A1 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-05-02 | — | — | WO | disclosed |
| EP-1220837-B1 | PROCESS FOR PREPARING PEROXIDES USING MIXED ANHYDRIDES | AKZO NOBEL NV (NL) | 2004-08-18 | — | — | EP | disclosed |
| US-20040049070-A1 | Reacting a hydroperoxide or acyl hydroperoxide with a mixed anhydride having a -C(O)-O-C(O)-O- group to form a peracid or diacyl peroxide; | OVERKAMP JOHANNES WILLIBRORDUS (NL) | 2004-03-11 | — | — | US | disclosed |
| US-6610880-B1 | Reacting with an organohydroperoxide under basic conditions to form peracids, peresters, diacylperoxides or their hydroxy derivatives; low cost; odorless; high yield | AKZO NOBEL NV (NL) | 2003-08-26 | — | — | US | disclosed |
| US-5644004-A | Multi-component ethylenically unsaturated peroxyesters | ELF ATOCHEM NORTH AMERICA, INC. (US) | 1997-07-01 | — | — | US | disclosed |
| US-5612430-A | UNSATURATED PEROXIDE AS CHAIN TRANSFER AGENT, ADDITION POLYMERS | AKZO NOBEL NV (NL) | 1997-03-18 | — | — | US | disclosed |
| EP-0672070-A1 | PROCESS FOR MOLECULAR WEIGHT REGULATION IN (CO)POLYMERS | Akzo Nobel N.V. (NL) | 1995-09-20 | — | — | EP | disclosed |
| US-5420173-A | Curing unsaturated polyesters and peroxyester compositions | ARKEMA INC. | 1995-05-30 | — | — | US | disclosed |
| WO-1994013705-A1 | PROCESS FOR MOLECULAR WEIGHT REGULATION IN (CO)POLYMERS | AKZO NOBEL N.V. (NL) | 1994-06-23 | — | — | WO | disclosed |