Fluoride

Fluoride

SCHEMBL66660

F.[S]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL64507 1.00
Fluoride SCHEMBL875009 1.00
Fluoride SCHEMBL274534 1.00
Fluoride SCHEMBL1446174 1.00
Fluoride SCHEMBL64505 1.00
Fluoride SCHEMBL10352497 1.00
Fluoride SCHEMBL10425803 1.00
Fluoride SCHEMBL10352496 1.00
Fluoride SCHEMBL139013 1.00
Fluoride SCHEMBL24172 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 5606 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12615980-B2 Etching of indium gallium zinc oxide LAM RESEARCH CORPORATION (US) 2026-04-28 US claimed
US-12611634-B2 Separation membrane complex, method of producing separation membrane complex, and separation method NGK INSULATORS, LTD. (JP) 2026-04-28 US claimed
US-12589362-B2 Support, zeolite membrane complex, method of producing zeolite membrane complex, and separation method NGK INSULATORS, LTD. (JP) 2026-03-31 US claimed
CN-121123019-B High aspect ratio etching structure and manufacturing method thereof 上海邦芯半导体科技有限公司 2026-02-27 CN claimed
US-20260040707-A1 DEEP TRENCH ISOLATION FOR PIXELS IN IMAGE SENSORS TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-02-05 US claimed
US-20260026282-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING LOW-TEMPERATURE PLASMA ETCHING PROCESS SAMSUNG ELECTRONICS CO, LTD. (KR) 2026-01-22 US claimed
US-12531211-B2 Sulfur-containing molecules for high aspect ratio plasma etching processes L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2026-01-20 US claimed
US-20250346929-A1 IMMOBILIZED ENZYMES FOR THE BIOELECTRIC PRODUCTION OF HYDROGEN PEROXIDE ANODYNE CHEMISTRIES INC (CA) 2025-11-13 US claimed
US-12469711-B2 Etching method ULVAC, INC. (JP) 2025-11-11 US claimed
EP-4510271-B1 ELECTROLYTE AND SODIUM ION SECONDARY BATTERY, BATTERY PACK, BATTERY MODULE AND ELECTRIC DEVICE COMPRISING SAME CONTEMPORARY AMPEREX TECHNOLOGY HONG KONG LTD (HK) 2025-11-05 EP claimed
EP-0284297-A1 Halogenated Naphthalene Derivatives NIPPON OIL CO. LTD. (JP) 1988-09-28 EP claimed
CN-85102711-A Severe toxicity molecular-sieve removing adsorbent of low-fluorine sulfide impurities and preparation thereof 1986-09-17 CN claimed
US-4594203-A Method for producing a thermoplastic polymeric sheet TORAY INDUSTRIES, INC. (JP) 1986-06-10 US claimed
EP-0053499-B1 PROCESS FOR PRODUCING CRYSTALLINE ALUMINOSILICATES MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1985-08-21 EP claimed
EP-0031255-B1 CRYSTALLINE ALUMINOSILICATES, THEIR PRODUCTION AND USE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1985-07-24 EP claimed
US-4444738-A Process for producing crystalline aluminosilicates MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1984-04-24 US claimed
EP-0053499-A1 Process for producing crystalline aluminosilicates MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1982-06-09 EP claimed
EP-0031255-A2 Crystalline aluminosilicates, their production and use MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1981-07-01 EP claimed
EP-0020053-A1 Desulphurization of oil KINNERET ENTERPRISES LIMITED (HK) 1980-12-10 EP claimed
US-4082839-A PREPARATION OF SULFUR FLUORIDES ALLIED CHEMICAL CORPORATION (US) 1978-04-04 US claimed