⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1053319 | 0.72 | — | — | |
| SCHEMBL1955727 | 0.69 | — | — | |
| SCHEMBL28886918 | 0.67 | — | — | |
| SCHEMBL1258387 | 0.63 | — | — | |
| SCHEMBL1472170 | 0.61 | — | — | |
| SCHEMBL1992270 | 0.60 | — | — | |
| SCHEMBL384408 | 0.60 | — | — | |
| SCHEMBL524074 | 0.57 | — | — | |
| SCHEMBL9229167 | 0.57 | — | — | |
| SCHEMBL15403194 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116034127-B | Silicon-containing monomer mixture, polysiloxane, resin composition, photosensitive resin composition, cured film, method for producing cured film, pattern cured film, and method for producing pattern cured film | 中央硝子株式会社 | 2024-03-01 | — | — | CN | disclosed |
| CN-116601244-A | Coating liquid for optical member, polymer, cured film, photosensitive coating liquid, pattern cured film, optical member, solid-state imaging element, display device, silicone compound, stabilizer used in coating liquid, method for producing cured film, method for producing pattern cured film, and method for producing polymer | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116601210-A | Resin composition, cured film, method for producing cured film, substrate with multilayer film, method for producing substrate with pattern, photosensitive resin composition, method for producing pattern cured film, method for producing polymer, and method for producing resin composition | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116265033-A | Long-acting anticoagulation coating and plasma preparation method and application thereof | 中国科学院深圳先进技术研究院 | 2023-06-20 | — | — | CN | disclosed |
| CN-116034127-A | Silicon-containing monomer mixture, polysiloxane, resin composition, photosensitive resin composition, cured film, method for producing cured film, pattern cured film, and method for producing pattern cured film | 中央硝子株式会社 | 2023-04-28 | — | — | CN | disclosed |
| CN-115244465-A | Negative photosensitive resin composition, pattern structure, and method for producing pattern cured film | 中央硝子株式会社 | 2022-10-25 | — | — | CN | disclosed |
| CN-112625243-A | Fluorine-containing modified polysiloxane, preparation method and application thereof | 山东东岳高分子材料有限公司 | 2021-04-09 | — | — | CN | disclosed |
| EP-0969007-B1 | Method of making an aromatic chlorosilane compound by a hydrosilation reaction | DOW CORNING ASIA LTD (JP) | 2004-09-22 | — | — | EP | disclosed |
| US-6699956-B2 | ORGANOPOLYSILOXANE CONTAINING A CYANOALKYL GROUP AND A MONOVALENT HYDROCARBON GROUP HAVING AN ALIPHATIC UNSATURATED BOND, ORGANOHYDROGENPOLYSILOXANE CONTAINING A CYANOALKYL GROUP, PLATINUM GROUP METAL CATALYST | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-03-02 | — | — | US | disclosed |
| US-20020198319-A1 | Highly dielectric addition type curable compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-12-26 | — | — | US | disclosed |
| US-6054602-A | Method of making an aromatic chlorosilane compound by a hydrosilation reaction | DOW CORNING ASIA, LTD. (JP) | 2000-04-25 | — | — | US | disclosed |
| US-6022814-A | COATING A POLYSILOXANE/SILSESQUIOXANE ON THE SUBSTRATE; HEATING TO A TEMPERATURE RANGING FROM 250.DEGREE. C. TO THE GLASS TRANSITION POINT OF THE POLYMER; DIELECTRIC FILM OF LOW DENSITY AND A LARGE FREE VOLUME; HEAT RESISTANCE | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-02-08 | — | — | US | disclosed |
| EP-0969007-A2 | Method of making an aromatic chlorosilane compound by a hydrosilation reaction | Dow Corning Asia, Ltd. (JP) | 2000-01-05 | — | — | EP | disclosed |