SCHEMBL6671677

SCHEMBL6671677

CC(S)C(S)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19426382 0.79
SCHEMBL7518519 0.79
SCHEMBL22893335 0.79
SCHEMBL29525394 0.76
SCHEMBL5949334 0.76
SCHEMBL31683765 0.76
SCHEMBL8851231 0.76
SCHEMBL9763178 0.73
SCHEMBL9763699 0.73
SCHEMBL15329582 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104231119-A Preparation method of long-chain branched cis-rich polybutadiene CHINA PETROLEUM & CHEMICAL 2014-12-24 CN claimed
CN-104231119-A Preparation method of long-chain branched cis-rich polybutadiene CHINA PETROLEUM & CHEMICAL 2014-12-24 CN disclosed
EP-1057843-B1 Aqueous emulsion, process for producing the same and aqueous paint and aqueous printing ink comprising the same NIPPON POLYURETHANE KOGYO KK (JP) 2004-09-15 EP disclosed
EP-0751161-B1 Sulfur-containing urethane-based resin composition, optical element and lens comprising this resin MITSUI CHEMICALS INC (JP) 2003-01-02 EP disclosed
CN-1082968-C Sulfur-containing urethane-based resin composition, its resin, and optical element and lens comprising resin thereof MITSUI CHEMICALS INC (JP) 2002-04-17 CN disclosed
US-6306947-B1 Printing ink and paint composed of an aqueous emulsion of self-emulsifiable urethane copolymer NIPPON POLYURETHANE INDUSTRY CO., LTD. (JP) 2001-10-23 US disclosed
EP-1057843-A1 Aqueous emulsion, process for producing the same and aqueous paint and aqueous printing ink comprising the same NIPPON POLYURETHANE INDUSTRY CO. LTD. (JP) 2000-12-06 EP disclosed
US-5736609-A A POLYTHIO COMPOUND CONTAINING AT LEAST TWO MERCAPTO GROUPS, A POLYISO(THIO)CYANATE COMPOUND, AND A COMPOUND HAVING TWO OR MORE UNSATURATED REACTIVE GROUPS MITSUI TOATSU CHEMICALS, INC. (JP) 1998-04-07 US disclosed
CN-1148055-A Sulfur-containing urethane-based resin composition, its resin, and optical element and lens comprising resin thereof MITSUI TOATSU CHEMICALS (JP) 1997-04-23 CN disclosed
US-5338571-A Surface modification of substrates to provide covalent bonding with fullerenes NORTHWESTERN UNIVERSITY (US) 1994-08-16 US disclosed