⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL650289 | 1.00 | — | — | |
| SCHEMBL5011703 | 0.98 | — | — | |
| SCHEMBL30238532 | 0.82 | — | — | |
| SCHEMBL30238533 | 0.82 | — | — | |
| SCHEMBL18917446 | 0.82 | — | — | |
| SCHEMBL30239429 | 0.82 | — | — | |
| SCHEMBL650478 | 0.82 | — | — | |
| SCHEMBL668024 | 0.82 | — | — | |
| SCHEMBL18917084 | 0.80 | — | — | |
| SCHEMBL10031079 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8987029-B2 | Protective thin films for use during fabrication of semiconductors, MEMS, and microstructures | APPLIED MICROSTRUCTURES, INC. (US) | 2015-03-24 | — | — | US | disclosed |
| US-8425789-B2 | Method and apparatus for anisotropic etching | ROLITH, INC. (US) | 2013-04-23 | — | — | US | disclosed |
| US-8334217-B2 | Material deposition over template | ROLITH INC. (US) | 2012-12-18 | — | — | US | disclosed |
| US-8318386-B2 | Fabrication of nanostructured devices | ROLITH INC. (US) | 2012-11-27 | — | — | US | disclosed |
| US-8192920-B2 | Lithography method | ROLITH INC. (US) | 2012-06-05 | — | — | US | disclosed |
| US-20120045884-A1 | PROTECTIVE THIN FILMS FOR USE DURING FABRICATION OF SEMICONDUCTORS, MEMS, AND MICROSTRUCTURES | SPTS TECHNOLOGIES LIMITED (GB) | 2012-02-23 | — | — | US | disclosed |
| US-8067258-B2 | Protective thin films for use during fabrication of semiconductors, MEMS, and microstructures | APPLIED MICROSTRUCTURES, INC. (US) | 2011-11-29 | — | — | US | disclosed |
| US-20100173494-A1 | Method and apparatus for anisotropic etching | ROLITH, INC (US) | 2010-07-08 | — | — | US | disclosed |
| US-7745102-B2 | Immersion fluids for lithography | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2010-06-29 | — | — | US | disclosed |
| US-20100035163-A1 | Fabrication of nanostructured devices | ROLITH, INC. (US) | 2010-02-11 | — | — | US | disclosed |
| US-20090305513-A1 | Material deposition over template | ROLITH, INC. (US) | 2009-12-10 | — | — | US | disclosed |
| US-20090269705-A1 | Lighography method | ROLITH, INC (US) | 2009-10-29 | — | — | US | disclosed |
| US-20080063989-A1 | IMMERSION FLUIDS FOR LITHOGRAPHY | MASS INSTITUTE OF TECHNOLOGY (US) | 2008-03-13 | — | — | US | disclosed |
| US-20070281492-A1 | Protective thin films for use during fabrication of semiconductors, MEMS, and microstructures | APPLIED MICROSTRUCTURES, INC. | 2007-12-06 | — | — | US | disclosed |
| US-7045170-B1 | Anti-stiction coating for microelectromechanical devices | SANDIA CORPORATION (US) | 2006-05-16 | — | — | US | disclosed |