⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16979018 | 0.62 | — | — | |
| SCHEMBL16256598 | 0.62 | — | — | |
| SCHEMBL6206902 | 0.62 | — | — | |
| SCHEMBL14594924 | 0.59 | — | — | |
| SCHEMBL1754789 | 0.59 | — | — | |
| SCHEMBL15086573 | 0.59 | — | — | |
| SCHEMBL5878660 | 0.59 | — | — | |
| SCHEMBL15297676 | 0.59 | — | — | |
| SCHEMBL7158413 | 0.58 | — | — | |
| Methylsulfanylmethane SCHEMBL5440614 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-10239908-A | — | — | None | — | — | JP | disclosed |
| EP-1213279-B1 | VENLAFAXINE PRODUCTION PROCESS | MEDICHEM SA (ES) | 2004-09-15 | — | — | EP | disclosed |
| US-6506941-B1 | Venlafaxine production process | MEDICHEM, S.A. (ES) | 2003-01-14 | — | — | US | disclosed |
| EP-1213279-A1 | VENLAFAXINE PRODUCTION PROCESS | Medichem S.A. (ES) | 2002-06-12 | — | — | EP | disclosed |
| US-6316170-B2 | COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-11-13 | — | — | US | disclosed |
| US-20010006767-A1 | Developing solution and method of forming polyimide pattern by using the developing solution | YOSHIAKI KAWAMONZEN | 2001-07-05 | — | — | US | disclosed |
| US-6183934-B1 | FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-02-06 | — | — | US | disclosed |
| US-6159654-A | Negative photosensitive polymer composition of a thermosetting polymer precursor curable by cyclodehydration upon heating | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-12-12 | — | — | US | disclosed |
| US-6001517-A | A THERMOSETTING POLYMER WHICH CAN BE CURED THROUGH CYCLODEHYDRATION UPON HEATING AND A CURE ACCELERATOR WHICH CAN BE DEACTIVATED OF ITS CURE ACCELERATION PROPERTY BY IRRIDIATION OF LIGHT | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-12-14 | — | — | US | disclosed |
| JP-H10239908-A | NEGATIVELY CHARGEABLE TONER | SHIKOKU CHEM CORP | 1998-09-11 | — | — | JP | disclosed |
| US-5756650-A | COMPOSITION COMPRISING POLYAMIC ACID, CURE ACCELERATOR SELECTED FROM GROUP CONSISTING OF NITROGEN-CONTAINING HETEROCYCLIC COMPOUND, AMINO ACID COMPOUND, AROMATIC COMPOUND HAVING TWO OR MORE HYDROXYL GROUPS | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-26 | — | — | US | disclosed |