Ethylene Glycol

Ethylene Glycol

SCHEMBL6689337

C=COC1CCCCC1.OCCO

nearest known ligand 0.31

Full drug profile on Sugi Atlas →

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA9 Q16790 1/20 0.31
EPHX1 P07099 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Alcohol SCHEMBL17821477 0.89 EPHX1 (0.41) CA12CA1CA2CA9EPHX1
SCHEMBL7535518 0.88 CA1 (0.33) CA12CA1CA2CA9
SCHEMBL36508 0.88
SCHEMBL411310 0.88 CA1 (0.33) CA12CA1CA2CA9
SCHEMBL413332 0.88 CA1 (0.33) CA12CA1CA2CA9
SCHEMBL28266563 0.88
Trolamine SCHEMBL5836119 0.86 CYP1A2 (0.31)
Methyl Alcohol SCHEMBL3459189 0.86 CA1 (0.33) CA12CA1CA2CA9EPHX1
SCHEMBL27680376 0.86 CA1 (0.33) CA12CA1CA2CA9EPHX1
Methyl Alcohol SCHEMBL2775810 0.86 CA1 (0.33) CA12CA1CA2CA9EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105408367-B Active energy ray-curable composition, and active energy ray-curable printing ink and printed matter using same DIC株式会社 2017-07-11 CN disclosed
CN-106795254-A Active energy ray-curable composition, active energy ray-curable printing ink using same, and printed matter DIC株式会社 2017-05-31 CN disclosed
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed