SCHEMBL6689624

SCHEMBL6689624

CC(C)[Si](C)(C)O[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL423973 0.81
SCHEMBL15450166 0.78
SCHEMBL10948945 0.73
SCHEMBL28553066 0.73
SCHEMBL9042804 0.73
SCHEMBL2443206 0.73
SCHEMBL14370712 0.73
SCHEMBL22551463 0.73
SCHEMBL15161789 0.71
SCHEMBL6351737 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3516089-B1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MAT US LLC (US) 2023-12-20 EP claimed
CN-113403605-A Compositions and methods for depositing silicon oxide films 弗萨姆材料美国有限责任公司 2021-09-17 CN claimed
EP-3516089-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS Versum Materials US, LLC (US) 2019-07-31 EP claimed
CN-109963963-A Compositions and methods for depositing silicon oxide films 弗萨姆材料美国有限责任公司 2019-07-02 CN claimed
WO-2018053129-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MATERIALS US, LLC (US) 2018-03-22 WO claimed
CN-113403605-A Compositions and methods for depositing silicon oxide films 弗萨姆材料美国有限责任公司 2021-09-17 CN disclosed
EP-1474465-A1 AMINOMETHYLENE-FUNCTIONAL SILOXANES Consortium für elektrochemische Industrie GmbH (DE) 2004-11-10 EP disclosed
WO-2003068845-A1 AMINOMETHYLENE-FUNCTIONAL SILOXANES Consortium für elektrochemische Industrie GmbH (DE) 2003-08-21 WO disclosed