SCHEMBL6689635

SCHEMBL6689635

C=C(C)c1ccc(OC(C)(CCC)OCCCCCC)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 2/20 0.40
TSHR P16473 1/20 0.40
PLA2G4B P0C869 6/20 0.40
PSEN1 P49768 2/20 0.38
PSEN2 P49810 2/20 0.38
APH1B Q8WW43 2/20 0.38
NCSTN Q92542 2/20 0.38
APH1A Q96BI3 2/20 0.38
PSENEN Q9NZ42 2/20 0.38
RARB P10826 3/20 0.38
NPC1 O15118 1/20 0.38
LMNA P02545 1/20 0.38
GAA P10253 1/20 0.38
MAPT P10636 1/20 0.38
ALOX15 P16050 1/20 0.38
RAB9A P51151 1/20 0.38
HSD17B10 Q99714 1/20 0.38
NR5A1 Q13285 1/20 0.38
PLA2G4A P47712 1/20 0.36
SLC2A1 P11166 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6693738 0.99 TP53 (0.38) TP53TSHRPLA2G4BPSEN1PSEN2
SCHEMBL6691454 0.96 ELANE (0.35) TP53TSHRPLA2G4BPSEN1PSEN2
SCHEMBL6691008 0.95 TP53 (0.40) TP53TSHRPLA2G4BPSEN1PSEN2
SCHEMBL6693132 0.93 TP53 (0.38) TP53TSHRPLA2G4BPSEN1PSEN2
SCHEMBL6691243 0.92 TP53 (0.42) TP53TSHRPLA2G4BPSEN1PSEN2
SCHEMBL6695241 0.91 TP53 (0.40) TP53TSHRPLA2G4BPSEN1PSEN2
SCHEMBL6697798 0.91 GAA (0.34) TP53TSHRPLA2G4BPSEN1PSEN2
SCHEMBL6692063 0.89 ELANE (0.36)
SCHEMBL6697849 0.88 GAA (0.36) TP53TSHRPLA2G4BPSEN1PSEN2
SCHEMBL6695731 0.86 HDAC3 (0.33) TP53TSHRPLA2G4BPSEN1PSEN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0959389-B1 Diazodisulfone compound and radiation-sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed