SCHEMBL6689915

SCHEMBL6689915

O=S1(=O)CS1(=O)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11631530 0.63
SCHEMBL7247949 0.60
SCHEMBL64228 0.57
SCHEMBL14389391 0.51
Oxygen SCHEMBL28403189 0.44
Oxygen SCHEMBL15808690 0.44
SCHEMBL3263250 0.44
SCHEMBL1257 0.44
SCHEMBL28075143 0.44
SCHEMBL18575258 0.44

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118742068-A Four-terminal perovskite crystal silicon laminated cell and preparation method thereof 江阴晶皓新能源科技有限公司 2024-10-01 CN claimed
CN-115467040-B Antibacterial nano air filter material and preparation method and application thereof 厦门赋源高科技有限公司 2023-10-20 CN claimed
CN-115467040-A Antibacterial nano air filter material and preparation method and application thereof 厦门赋源高科技有限公司 2022-12-13 CN claimed
EP-4677003-A1 METHOD FOR PRODUCING POLYURETHANES WITHOUT ISOCYANATE Saint-Gobain Weber France (FR) 2026-01-14 EP disclosed
US-20250215256-A1 POLYMER FILM-FORMING COMPOSITION AND SELECTIVE POLYMER FILM-FORMING METHOD NISSAN CHEMICAL CORPORATION (JP) 2025-07-03 US disclosed
US-20250171662-A1 THERMOFORMED SHEET 3M INNOVATIVE PROPERTIES COMPANY (US) 2025-05-29 US disclosed
EP-4503100-A1 POLYMER FILM-FORMING COMPOSITION AND SELECTIVE POLYMER FILM-FORMING METHOD Nissan Chemical Corporation (JP) 2025-02-05 EP disclosed
EP-4486559-A1 THERMOFORMED SHEET 3M Innovative Properties Company (US) 2025-01-08 EP disclosed
CN-113316595-B Composition for forming protective film having acetal structure and amide structure 日产化学株式会社 2024-12-03 CN disclosed
CN-118946956-A Composition for forming polymer film and method for forming selective polymer film 日产化学株式会社 2024-11-12 CN disclosed
CN-118742068-A Four-terminal perovskite crystal silicon laminated cell and preparation method thereof 江阴晶皓新能源科技有限公司 2024-10-01 CN disclosed
EP-0513587-A1 Process for preparing 3-alkeny-lidene-1, 1-bisphosphonates E.R. SQUIBB &amp; SONS, INC. (US) 1992-11-19 EP disclosed
US-5103036-A Catalyzed coupling of allyl ester with methylenebisphosphonate E. R. SQUIBB & SONS, INC. (US) 1992-04-07 US disclosed
US-4845018-A BLOCKED DEVELOPMENT INHIBITOR FUJI PHOTO FILM, CO., LTD. (JP) 1989-07-04 US disclosed
US-4775610-A TO RELEASE PHOTOGRAPHIC USEFUL AGENT FUJI PHOTO FILM CO., LTD. (JP) 1988-10-04 US disclosed
US-4734353-A STORAGE STABILITY; EFFICIEN RELEASE OF USEFUL AGENTS FROM BLOCKED PHOTOGRAPHIC AGENT FUJI PHOTO FILM CO., LTD. (JP) 1988-03-29 US disclosed
US-4729936-A WIDE TEMPERATURE RANGE, PYRAZOLE COMPOUNDS FUJI PHOTO FILM CO., LTD. (JP) 1988-03-08 US disclosed
US-4695525-A HEAT DEVELOPMENT, PYRAZOLONE FUJI PHOTO FILM CO., LTD. (JP) 1987-09-22 US disclosed
US-4678739-A RELEASING PHOTOGRAPHICALLY USEFUL COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1987-07-07 US disclosed
EP-0187343-A2 Image forming method including heating step FUJI PHOTO FILM CO., LTD. (JP) 1986-07-16 EP disclosed