SCHEMBL6721029

SCHEMBL6721029

O=C(Oc1ccccc1)c1ccc(C(=S)SCc2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP10 Q53GL7 1/20 0.46
PRSS1 P07477 1/20 0.46
ACR P10323 1/20 0.46
TMPRSS15 P98073 1/20 0.46
ALDH1A1 P00352 6/20 0.45
HPGD P15428 1/20 0.45
KMT2A Q03164 5/20 0.45
PKM P14618 1/20 0.44
HDAC3 O15379 1/20 0.44
HDAC4 P56524 1/20 0.44
HDAC1 Q13547 1/20 0.44
HDAC7 Q8WUI4 1/20 0.44
HDAC2 Q92769 1/20 0.44
HDAC10 Q969S8 1/20 0.44
HDAC11 Q96DB2 1/20 0.44
HDAC8 Q9BY41 1/20 0.44
HDAC6 Q9UBN7 1/20 0.44
HDAC9 Q9UKV0 1/20 0.44
HDAC5 Q9UQL6 1/20 0.44
MAPT P10636 5/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6721027 0.96 PARP10 (0.49) PARP10PRSS1ACRTMPRSS15ALDH1A1
SCHEMBL164241 0.82 CA12 (0.59) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL36459 0.79 CA12 (0.59) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL16300498 0.78 KMT2A (0.53) PARP10PRSS1ACRTMPRSS15ALDH1A1
SCHEMBL20815367 0.77 HDAC3 (0.56) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL7582816 0.77 NPC1 (0.50) ALDH1A1KMT2AHDAC3HDAC4HDAC1
SCHEMBL70034 0.77 PARP10 (0.70) PARP10PRSS1ACRTMPRSS15ALDH1A1
SCHEMBL13991169 0.76 HPGD (0.49) ALDH1A1HPGDKMT2AHDAC3HDAC4
SCHEMBL6721001 0.76 CA12 (0.52) ALDH1A1HPGDKMT2AHDAC3HDAC4
SCHEMBL26038913 0.76 PARP10 (0.56) PARP10PRSS1ACRTMPRSS15ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
EP-1975712-A2 Positive resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-10-01 EP disclosed