SCHEMBL6734284

SCHEMBL6734284

CCO[Si](CCOCCC(CCOC)C1(C)COC1)(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7592156 0.89
SCHEMBL6739557 0.89
SCHEMBL6739856 0.87
SCHEMBL6734285 0.77
SCHEMBL6812544 0.74
SCHEMBL6614844 0.72
SCHEMBL6817215 0.72
SCHEMBL6813272 0.72
SCHEMBL6817212 0.72
SCHEMBL6811735 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2774942-A1 BIVALENT-TRIVALENT METAL ORGANIC-INORGANIC LAYERED COMPOSITE, AND MANUFACTURING METHOD FOR SAME Kabushiki Kaisha Toyota Chuo Kenkyusho (JP) 2014-09-10 EP disclosed
US-6686047-B2 FOR PRODUCING COATINGS WITH HIGH HARDNESS, SCRATCH RESISTANCE, ABRASION RESISTANCE, LOW CURLING PROPERTIES, ADHESION, AND CHEMICAL RESISTANCE DSM N.V. (NL) 2004-02-03 US disclosed
EP-0965618-B1 Photo-curable composition and photo-cured product JSR CORP (JP) 2004-01-02 EP disclosed
US-20030099824-A1 Reactive particles, curable composition comprising the same and cured products DSM IP ASSETS B.V. (NL) 2003-05-29 US disclosed
US-6207728-B1 COMPOSITION COMPRISING BOTH HYDROLYZABLE SILANE COMPOUND AND HYDROLYZATE THEREOF OR EITHER ONE, PHOTO ACID GENERATOR, DEHYDRATING AGENT JSR CORPORATION (JP) 2001-03-27 US disclosed
EP-0965618-A1 Photo-curable composition and photo-cured product JSR Corporation (JP) 1999-12-22 EP disclosed