Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | KCNN4 | O15554 | 4/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.32 |
| ▸ | ESR1 | P03372 | 1/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6323711 | 0.81 | MAPK1 (0.41) | MAPK1TSHRCES1KCNN4ALDH1A1 | |
| SCHEMBL8366811 | 0.79 | MAPK1 (0.44) | MAPK1TSHRCES1KCNN4ALDH1A1 | |
| SCHEMBL5428022 | 0.78 | MAPK1 (0.42) | MAPK1TSHRCES1KCNN4ALDH1A1 | |
| SCHEMBL28426778 | 0.77 | MAPK1 (0.39) | MAPK1TSHRKCNN4ALDH1A1ALOX15 | |
| SCHEMBL27705942 | 0.73 | KCNN4 (0.32) | MAPK1TSHRKCNN4 | |
| SCHEMBL5416463 | 0.73 | MAPK1 (0.38) | MAPK1TSHRCES1KCNN4ALDH1A1 | |
| SCHEMBL10627100 | 0.71 | MAPK1 (0.41) | MAPK1TSHRCES1KCNN4ALDH1A1 | |
| SCHEMBL20658081 | 0.70 | MAPK1 (0.44) | MAPK1TSHRCES1KCNN4ALDH1A1 | |
| SCHEMBL10632875 | 0.70 | MAPK1 (0.44) | MAPK1TSHRCES1KCNN4ALDH1A1 | |
| SCHEMBL28405535 | 0.68 | MAPK1 (0.48) | MAPK1TSHRCES1KCNN4ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040180222-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. | 2004-09-16 | — | — | US | disclosed |