⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29403064 | 0.81 | — | — | |
| Ethylene Glycol SCHEMBL8823004 | 0.75 | TSHR (0.33) | — | |
| SCHEMBL11504928 | 0.74 | — | — | |
| SCHEMBL10436477 | 0.73 | — | — | |
| SCHEMBL21229944 | 0.72 | — | — | |
| SCHEMBL4285379 | 0.71 | — | — | |
| SCHEMBL19678262 | 0.71 | — | — | |
| SCHEMBL55913 | 0.69 | — | — | |
| SCHEMBL8330698 | 0.69 | — | — | |
| SCHEMBL2104477 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112771144-A | POST chemical mechanical polishing (POST CMP) cleaning composition for cerium particles | 恩特格里斯公司 | 2021-05-07 | — | — | CN | disclosed |
| US-20040217006-A1 | Residue removers for electrohydrodynamic cleaning of semiconductors | EKC TECHNOLOGY, INC. | 2004-11-04 | — | — | US | disclosed |
| EP-0702071-B1 | Two-pack aqueous adhesive | SUNSTAR ENGINEERING INC (JP) | 2001-05-30 | — | — | EP | disclosed |
| US-5726242-A | POLYCARBONATEURETHANE, LOW TEMPERATURE LAMINATION OF COMPLEX SHAPES | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 1998-03-10 | — | — | US | disclosed |
| EP-0702071-A2 | Two-pack aqueous adhesive | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 1996-03-20 | — | — | EP | disclosed |