⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6745475 | 1.00 | — | — | |
| SCHEMBL5986871 | 0.69 | — | — | |
| SCHEMBL5986869 | 0.69 | — | — | |
| SCHEMBL9509929 | 0.67 | — | — | |
| SCHEMBL9509932 | 0.67 | — | — | |
| SCHEMBL19509996 | 0.67 | — | — | |
| SCHEMBL27322251 | 0.65 | — | — | |
| SCHEMBL18456489 | 0.65 | — | — | |
| SCHEMBL20605353 | 0.65 | — | — | |
| SCHEMBL8464237 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6812146-B2 | Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound | MICRON TECHNOLOGY, INC. | 2004-11-02 | — | — | US | claimed |
| US-20030165619-A1 | Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound | AKRAM SALMAN (US) | 2003-09-04 | — | — | US | claimed |
| US-6531192-B2 | Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound | MICRON TECHNOLOGY, INC. | 2003-03-11 | — | — | US | claimed |
| US-20020051847-A1 | Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2002-05-02 | — | — | US | claimed |
| US-6338880-B1 | Chemical vapor deposition process for depositing titanium nitride films from an organometallic compound | MICRON TECHNOLOGY, INC. | 2002-01-15 | — | — | US | claimed |
| US-6812146-B2 | Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound | MICRON TECHNOLOGY, INC. | 2004-11-02 | — | — | US | disclosed |
| US-6696109-B2 | Chemical vapor deposition process for depositing titanium silicide films from an organometallic compound | MICRON TECHNOLOGY, INC. | 2004-02-24 | — | — | US | disclosed |
| US-20030165619-A1 | Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound | AKRAM SALMAN (US) | 2003-09-04 | — | — | US | disclosed |
| US-20030072892-A1 | Chemical vapor deposition process for depositing titanium silicide films from an organometallic compound | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2003-04-17 | — | — | US | disclosed |
| US-6531192-B2 | Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound | MICRON TECHNOLOGY, INC. | 2003-03-11 | — | — | US | disclosed |
| US-6500501-B1 | Chemical vapor deposition process for depositing titanium silicide films from an organometallic compound | MICORN TECHNOLOGY, INC. | 2002-12-31 | — | — | US | disclosed |
| US-6500501-B1 | Chemical vapor deposition process for depositing titanium silicide films from an organometallic compound | MICORN TECHNOLOGY, INC. | 2002-12-31 | — | — | US | disclosed |
| US-20020051847-A1 | Chemical vapor deposition process for depositing titanium nitride films from an organo-metallic compound | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2002-05-02 | — | — | US | disclosed |
| US-6338880-B1 | Chemical vapor deposition process for depositing titanium nitride films from an organometallic compound | MICRON TECHNOLOGY, INC. | 2002-01-15 | — | — | US | disclosed |
| US-6168837-B1 | Chemical vapor depositions process for depositing titanium silicide films from an organometallic compound | MICRON TECHNOLOGY, INC. | 2001-01-02 | — | — | US | disclosed |
| US-6168837-B1 | Chemical vapor depositions process for depositing titanium silicide films from an organometallic compound | MICRON TECHNOLOGY, INC. | 2001-01-02 | — | — | US | disclosed |