SCHEMBL6746600

SCHEMBL6746600

CCO[Si](CCC#N)(CCC(F)(F)F)OCC

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2231179 0.84
SCHEMBL9330179 0.81
SCHEMBL1470070 0.77
SCHEMBL26926624 0.77 TSHR (0.33) MEN1KMT2A
SCHEMBL10600186 0.73 TSHR (0.41)
SCHEMBL1585427 0.72 TSHR (0.44) MEN1KMT2A
SCHEMBL4783974 0.70
SCHEMBL6327251 0.68
SCHEMBL109113 0.68 TSHR (0.36) MEN1KMT2A
SCHEMBL180362 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6699956-B2 ORGANOPOLYSILOXANE CONTAINING A CYANOALKYL GROUP AND A MONOVALENT HYDROCARBON GROUP HAVING AN ALIPHATIC UNSATURATED BOND, ORGANOHYDROGENPOLYSILOXANE CONTAINING A CYANOALKYL GROUP, PLATINUM GROUP METAL CATALYST SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-03-02 US disclosed
US-20020198319-A1 Highly dielectric addition type curable compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-12-26 US disclosed
EP-0319883-B1 A film capacitor SHINETSU CHEMICAL CO (JP) 1994-03-23 EP disclosed
US-4843517-A DIELECTRIC FILM FORMED FROM A CYANOALKYL-CONTAINING POLYSILOXANE; NO MOISTURE ABSORPTION; HEAT RESISTANCE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1989-06-27 US disclosed
EP-0319883-A2 A film capacitor Shin-Etsu Chemical Co., Ltd. (JP) 1989-06-14 EP disclosed