Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL6754270

CCCCCCCCCCCC(=O)CNCCS(=O)(=O)O.N

nearest known ligand 0.47

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Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 4/20 0.47
FAAH O00519 2/20 0.42
HAO1 Q9UJM8 1/20 0.42
MAPT P10636 1/20 0.42
KMT2A Q03164 1/20 0.42
CA2 P00918 3/20 0.40
CA12 O43570 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
CA14 Q9ULX7 1/20 0.40
CASP2 P42575 1/20 0.40
EPHX1 P07099 4/20 0.39
CA1 P00915 2/20 0.39
CES2 O00748 3/20 0.38
CES1 P23141 3/20 0.38
HSP90AA1 P07900 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL1573561 1.00 EPHX2 (0.47) EPHX2FAAHHAO1MAPTKMT2A
SCHEMBL9617463 0.98 EPHX2 (0.48) EPHX2FAAHHAO1MAPTKMT2A
SCHEMBL2043850 0.98 EPHX2 (0.48) EPHX2FAAHHAO1MAPTKMT2A
SCHEMBL2042990 0.98 EPHX2 (0.48) EPHX2FAAHHAO1MAPTKMT2A
SCHEMBL8376668 0.98 EPHX2 (0.48) EPHX2FAAHHAO1MAPTKMT2A
SCHEMBL2047359 0.98 EPHX2 (0.48) EPHX2FAAHHAO1MAPTKMT2A
SCHEMBL1784543 0.97 EPHX2 (0.47) EPHX2FAAHHAO1MAPTKMT2A
SCHEMBL944529 0.97 EPHX2 (0.47) EPHX2FAAHHAO1MAPTKMT2A
SCHEMBL1785340 0.97 EPHX2 (0.47) EPHX2FAAHHAO1MAPTKMT2A
SCHEMBL944994 0.97 EPHX2 (0.47) EPHX2FAAHHAO1MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1225214-B1 Detergent composition SHISEIDO CO LTD (JP) 2004-05-06 EP disclosed
EP-0999260-B1 Detergent composition SHISEIDO CO LTD (JP) 2003-12-10 EP disclosed
EP-1225214-A2 Detergent composition SHISEIDO COMPANY LIMITED (JP) 2002-07-24 EP disclosed
US-6303559-B1 ALKALI METAL N-METHYLTAURATE SALT OF AN N-ACYLMETHYLTAURINE SHISEIDO COMPANY, LTD. (JP) 2001-10-16 US disclosed
EP-0999260-A2 Detergent composition SHISEIDO COMPANY LIMITED (JP) 2000-05-10 EP disclosed