⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL38886 | 0.87 | — | — | |
| SCHEMBL11450982 | 0.87 | — | — | |
| SCHEMBL9310288 | 0.75 | — | — | |
| Water SCHEMBL863986 | 0.75 | — | — | |
| SCHEMBL29262278 | 0.75 | — | — | |
| SCHEMBL16566921 | 0.75 | — | — | |
| SCHEMBL1585829 | 0.75 | — | — | |
| SCHEMBL3152282 | 0.75 | — | — | |
| SCHEMBL6293223 | 0.75 | — | — | |
| Phosphine SCHEMBL28523290 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6486020-B1 | High pressure reoxidation/anneal of high dielectric constant materials | MICRON TECHNOLOGY, INC. | 2002-11-26 | — | — | US | claimed |
| US-6251720-B1 | FORMING CAPACITORS; HIGH PRESSURE SURFACE TREATMENT | ROUND ROCK RESEARCH, LLC | 2001-06-26 | — | — | US | claimed |
| US-6794703-B1 | High pressure reoxidation/anneal of high dielectric constant | MICRON TECHNOLOGY, INC. | 2004-09-21 | — | — | US | disclosed |
| US-6486020-B1 | High pressure reoxidation/anneal of high dielectric constant materials | MICRON TECHNOLOGY, INC. | 2002-11-26 | — | — | US | disclosed |
| US-6251720-B1 | FORMING CAPACITORS; HIGH PRESSURE SURFACE TREATMENT | ROUND ROCK RESEARCH, LLC | 2001-06-26 | — | — | US | disclosed |