Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDE9A | O76083 | 2/20 | 0.36 |
| ▸ | MCHR1 | Q99705 | 2/20 | 0.34 |
| ▸ | FABP7 | O15540 | 1/20 | 0.34 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.34 |
| ▸ | CARM1 | Q86X55 | 2/20 | 0.33 |
| ▸ | PRMT1 | Q99873 | 2/20 | 0.33 |
| ▸ | HRH4 | Q9H3N8 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.33 |
| ▸ | HRH1 | P35367 | 1/20 | 0.32 |
| ▸ | PDE4A | P27815 | 1/20 | 0.32 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.32 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.32 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.32 |
| ▸ | VCP | P55072 | 1/20 | 0.32 |
| ▸ | LOX | P28300 | 1/20 | 0.32 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.32 |
| ▸ | CCNB2 | O95067 | 1/20 | 0.32 |
| ▸ | CCNE2 | O96020 | 1/20 | 0.32 |
| ▸ | CDK1 | P06493 | 1/20 | 0.32 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL233125 | 1.00 | PDE9A (0.36) | PDE9AMCHR1FABP7FABP5CARM1 | |
| SCHEMBL2921894 | 1.00 | PDE9A (0.36) | PDE9AMCHR1FABP7FABP5CARM1 | |
| SCHEMBL676963 | 0.98 | PDE9A (0.34) | PDE9AMCHR1FABP7FABP5CARM1 | |
| SCHEMBL232553 | 0.94 | HRH1 (0.33) | PDE9APDK2HRH1PDE4APDE4B | |
| SCHEMBL6530733 | 0.92 | PDE9A (0.35) | PDE9AMCHR1FABP7FABP5CARM1 | |
| SCHEMBL709427 | 0.90 | HRH1 (0.35) | HRH1 | |
| SCHEMBL677022 | 0.89 | HRH1 (0.32) | HRH1 | |
| SCHEMBL4352771 | 0.87 | HRH1 (0.30) | HRH1 | |
| SCHEMBL677299 | 0.84 | PDE9A (0.30) | PDE9A | |
| SCHEMBL4361390 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| EP-1367439-B1 | Radiation-sensitive composition | FUJIFILM CORP (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| EP-2399168-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM Corporation (JP) | 2011-12-28 | — | — | EP | disclosed |
| WO-2010150917-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-29 | — | — | WO | disclosed |
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| EP-1465010-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2009-10-21 | — | — | EP | disclosed |
| US-7374860-B2 | Positive resist composition and pattern forming method using the same | FUJI FILM CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| US-6692883-B2 | GENERATING ACID; ADJUSTMENT SOLUBILITY IN ALKLAINE DEVELOPER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| EP-1367439-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-6630280-B1 | Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-20030108811-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-06-12 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-4140681-A | ANTICOAGULANTS | MITSUBISHI CHEMICAL INDUSTRIES, LIMITED (JP) | 1979-02-20 | — | — | US | disclosed |
| US-4131673-A | INHIBITION AND SUPPRESSION OF THROMBOSIS IN MAMMALS | MITSUBISHI CHEMICAL INDUSTRIES, LIMITED (JP) | 1978-12-26 | — | — | US | disclosed |
| US-4125604-A | PEPTIDES, ANTITHROMBOSIS | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1978-11-14 | — | — | US | disclosed |
| US-4097591-A | ANTITHROMBOSIS | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JA) | 1978-06-27 | — | — | US | disclosed |