Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 4/20 | 0.43 |
| ▸ | NR5A1 | Q13285 | 1/20 | 0.42 |
| ▸ | CA12 | O43570 | 2/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | CA7 | P43166 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | CA3 | P07451 | 1/20 | 0.41 |
| ▸ | CA4 | P22748 | 1/20 | 0.41 |
| ▸ | CA6 | P23280 | 1/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.41 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL677235 | 0.95 | TSHR (0.47) | LTA4HNR5A1TSHR | |
| SCHEMBL20703535 | 0.93 | NQO1 (0.43) | LTA4HCA12CA1CA2CA7 | |
| SCHEMBL20819716 | 0.93 | TSHR (0.50) | LTA4HNR5A1TSHR | |
| SCHEMBL9167272 | 0.93 | TSHR (0.50) | LTA4HNR5A1TSHR | |
| SCHEMBL2092766 | 0.93 | TSHR (0.50) | LTA4HNR5A1TSHR | |
| SCHEMBL1664744 | 0.93 | TSHR (0.50) | LTA4HNR5A1TSHR | |
| SCHEMBL1452222 | 0.93 | TSHR (0.50) | LTA4HNR5A1TSHR | |
| SCHEMBL20819713 | 0.93 | TSHR (0.50) | LTA4HNR5A1TSHR | |
| SCHEMBL10514003 | 0.92 | RARB (0.44) | LTA4HNR5A1CA12CA1CA2 | |
| SCHEMBL1404367 | 0.91 | KMT2A (0.41) | LTA4HCA12CA1CA2CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106164058-A | Diaminourea pyrrolotriazine derivatives as herbicide | 巴斯夫欧洲公司 | 2016-11-23 | — | — | CN | claimed |
| US-6015907-A | PHOTOSTABLE IMAGING DYES FOR ACID-MEDIATED MEDIA, ALSO FOR PHOTOSENSITIZING ONIUM SALTS TO VISIBLE BLUE RADIATION | POLAROID CORPORATION (US) | 2000-01-18 | — | — | US | claimed |
| EP-0568344-A1 | Fluoran compounds and process for their production | FUJI PHOTO FILM CO., LTD. (JP) | 1993-11-03 | — | — | EP | claimed |
| CN-110520733-A | Kit and method for measuring substance to be measured in living body sample | FUJIFILM CORP | 2019-11-29 | — | — | CN | disclosed |
| CN-110520731-A | Kit, method and reagent for being measured to measured substance | FUJIFILM CORP | 2019-11-29 | — | — | CN | disclosed |
| CN-106164058-A | Diaminourea pyrrolotriazine derivatives as herbicide | 巴斯夫欧洲公司 | 2016-11-23 | — | — | CN | disclosed |
| CN-106132946-A | Diaminourea pyrrolotriazine derivatives as herbicide | 巴斯夫欧洲公司 | 2016-11-16 | — | — | CN | disclosed |
| US-9235117-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| CN-102816130-B | Thiazole compound and use thereof | OTSUKA PHARMA CO LTD | 2015-05-06 | — | — | CN | disclosed |
| EP-2864839-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2015-04-29 | — | — | EP | disclosed |
| EP-0951661-A1 | PROCESS AND COMPOSITION FOR GENERATING ACID | POLAROID CORPORATION (US) | 1999-10-27 | — | — | EP | disclosed |
| WO-1998024000-A1 | PROCESS AND COMPOSITION FOR GENERATING ACID | POLAROID CORPORATION (US) | 1998-06-04 | — | — | WO | disclosed |
| EP-0641786-B1 | Process for producing optically active alcohol | SUMITOMO CHEMICAL CO (JP) | 1997-08-20 | — | — | EP | disclosed |
| EP-0381434-B1 | Process for producing optically active alcohol | SUMITOMO CHEMICAL CO (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0641786-A1 | Process for producing optically active alcohol | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1995-03-08 | — | — | EP | disclosed |
| EP-0568344-A1 | Fluoran compounds and process for their production | FUJI PHOTO FILM CO., LTD. (JP) | 1993-11-03 | — | — | EP | disclosed |
| US-5144039-A | Reducing prochiral ketone with metal borohydride modified with optically active amino alcohol in presence of ether or sulfide | SUMITOMO ELECTRIC COMPANY, LIMITED (JP) | 1992-09-01 | — | — | US | disclosed |
| EP-0381434-A1 | Process for producing optically active alcohol | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-08-08 | — | — | EP | disclosed |
| US-4173630-A | N2 Arylsulfonyl-L-argininamides and the pharmaceutically acceptable salts thereof | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1979-11-06 | — | — | US | disclosed |