⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22319210 | 0.98 | — | — | |
| SCHEMBL676892 | 0.91 | — | — | |
| SCHEMBL15160648 | 0.89 | — | — | |
| SCHEMBL16016710 | 0.89 | — | — | |
| SCHEMBL27239661 | 0.87 | — | — | |
| SCHEMBL18858705 | 0.86 | — | — | |
| SCHEMBL30286703 | 0.86 | — | — | |
| SCHEMBL5667536 | 0.83 | — | — | |
| SCHEMBL5665996 | 0.81 | — | — | |
| SCHEMBL133730 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240258111-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | claimed |
| US-11447642-B2 | Methods of using surface treatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-09-20 | — | — | US | claimed |
| US-11174394-B2 | Surface treatment compositions and articles containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | claimed |
| US-20210122925-A1 | METHODS OF USING SURFACE TREATMENT COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-04-29 | — | — | US | claimed |
| CN-112513192-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2021-03-16 | — | — | CN | claimed |
| CN-111565859-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2020-08-21 | — | — | CN | claimed |
| US-20200035494-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2020-01-30 | — | — | US | claimed |
| US-20190211210-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2019-07-11 | — | — | US | claimed |
| WO-2014170799-A1 | CROSSLINKABLE VARNISH AND METHOD FOR APPLYING SAME | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2014-10-23 | — | — | WO | claimed |
| US-4946611-A | LUBRICANT, COMPATIBLE WITH FLON REFRIGERANTS | IDEMITSU KOSAN CO., LTD. (JP) | 1990-08-07 | — | — | US | claimed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| WO-2025096565-A1 | ETCHING COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-05-08 | — | — | WO | disclosed |
| US-20250136865-A1 | Etching Compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-01 | — | — | US | disclosed |
| EP-4535405-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| US-20030007050-A1 | Curable inkjet printable ink compositions | 3M INNOVATIVE PROPERTIES COMPANY | 2003-01-09 | — | — | US | disclosed |
| US-6461419-B1 | Curable inkjet printable ink compositions | 3M INNOVATIVE PROPERTIES COMPANY | 2002-10-08 | — | — | US | disclosed |
| EP-1238024-A1 | CURABLE INKJET PRINTABLE INK COMPOSITIONS | 3M Innovative Properties Company (US) | 2002-09-11 | — | — | EP | disclosed |
| WO-2001032789-A1 | CURABLE INKJET PRINTABLE INK COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2001-05-10 | — | — | WO | disclosed |
| US-4946611-A | LUBRICANT, COMPATIBLE WITH FLON REFRIGERANTS | IDEMITSU KOSAN CO., LTD. (JP) | 1990-08-07 | — | — | US | disclosed |