SCHEMBL679693

SCHEMBL679693

FC(F)CCC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2029616 0.83
SCHEMBL8051925 0.81
SCHEMBL29561504 0.78
SCHEMBL8055245 0.76
SCHEMBL15402661 0.76
SCHEMBL2051933 0.76
SCHEMBL15402436 0.76
SCHEMBL15402890 0.74
SCHEMBL18576908 0.73
SCHEMBL15403345 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 567 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12183591-B2 Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-12-31 US claimed
WO-2024254369-A1 AZEOTROPIC COMPOSITIONS COMPRISING HYDROGEN FLUORIDE THE CHEMOURS COMPANY FC, LLC (US) 2024-12-12 WO claimed
US-20220310407-A1 ETCHING GAS COMPOSITIONS, METHODS OF FORMING MICROPATTERNS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE Wonik Materials (KR) 2022-09-29 US claimed
US-11437244-B2 Dry etching gas composition and dry etching method KANTO DENKA KOGYO CO., LTD. (JP) 2022-09-06 US claimed
CN-114835872-A High-flame-retardance low-heat-conductivity polyurethane foam material and preparation method thereof 格力电器(武汉)有限公司 2022-08-02 CN claimed
US-20200234962-A1 DRY ETCHING GAS COMPOSITION AND DRY ETCHING METHOD KANTO DENKA KOGYO CO., LTD. (JP) 2020-07-23 US claimed
CN-111013338-A Drying method of halogenated hydrocarbon 北京诺维新材科技有限公司 2020-04-17 CN claimed
EP-3608945-A1 DRY ETCHING GAS COMPOSITION AND DRY ETCHING METHOD Kanto Denka Kogyo Co., Ltd. (JP) 2020-02-12 EP claimed
CN-110546742-A Dry etching gas composition and dry etching method KANTO DENKA KOGYO KK 2019-12-06 CN claimed
US-20190071544-A1 NOVEL ANTI-AGGLOMERANTS FOR POLYISOBUTYLENE PRODUCTION BASF SOUTH EAST ASIA PTE. LTD. (SG) 2019-03-07 US claimed
WO-2004058829-A1 POLYMERIZATION PROCESSES EXXONMOBIL CHEMICAL PATENTS, INC. (US) 2004-07-15 WO claimed
WO-2004058836-A1 POLYMERS WITH NEW SEQUENCE DISTRIBUTIONS EXXONMOBIL CHEMICAL PATENTS INC. (US) 2004-07-15 WO claimed
EP-0884339-A1 Method for producing foams from high acid polyester polyols Celotex Corporation (US) 1998-12-16 EP claimed
US-5837743-A CLOSED CELL, RIGID POLYMER FOAM FORMED BY CONVEYING POLYESTERURETHANE COPOLYMER WITH BLOWING AGENT FOR CLOSED CELL FOAMS CELOTEX CORPORATION (US) 1998-11-17 US claimed
US-5789458-A CLOSED CELL FOAMS OF POLYURETHANES AND POLYESTERURETHANE COPOLYMERS CELOTEX CORPORATION (US) 1998-08-04 US claimed
US-5660926-A USED IN BUILDING PANELS WHICH ARE HIGHLY INSULATING, DIMENSIONALLY STABLE, THERMAL RESISTANCE, SOUNDPROOF AND SELF-SUPPORTING THE CELOTEX CORPORATION (US) 1997-08-26 US claimed
US-5605940-A REDUCED COLD TEMPERATURE SHRINKAGE THE CELOTEX CORPORATION (US) 1997-02-25 US claimed
US-5565497-A CONTAINING FLUOROCHEMICAL SURFACTANT THE CELOTEX CORPORATION (US) 1996-10-15 US claimed
US-5563180-A REACTING POLYISOCYANATE, POLYESTERPOLYOL IN THE PRESENCE OF BLOWING AGENT AND CATALYST; CLOSED CELL RIGID FOAM THE CELOTEX CORPORATION (US) 1996-10-08 US claimed
EP-0726281-A2 High equivalent weight, polyester polyols for closed cell, rigid foams THE CELOTEX CORPORATION (US) 1996-08-14 EP claimed