⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL712921 | 0.70 | — | — | |
| SCHEMBL712922 | 0.70 | — | — | |
| SCHEMBL17707871 | 0.70 | — | — | |
| SCHEMBL22536 | 0.67 | — | — | |
| SCHEMBL10997529 | 0.67 | — | — | |
| SCHEMBL388465 | 0.67 | — | — | |
| SCHEMBL1122150 | 0.67 | — | — | |
| SCHEMBL9293031 | 0.67 | — | — | |
| SCHEMBL6518060 | 0.67 | — | — | |
| SCHEMBL2443 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240184203-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-06-06 | — | — | US | disclosed |
| WO-2024034311-A1 | SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD AND FILM FORMING COMPOSITION | JSR株式会社 | 2024-02-15 | — | — | WO | disclosed |
| US-11796912-B2 | Radiation-sensitive composition and pattern-forming method | JSR CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| WO-2023136260-A1 | METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, METHOD FOR FORMING RESIST UNDERLAYER FILM, AND CLEANING FLUID | JSR株式会社 | 2023-07-20 | — | — | WO | disclosed |
| WO-2023063207-A1 | METAL-CONTAINING FILM FORMATION COMPOSITION, METAL-CONTAINING FILM, METAL-CONTAINING FILM FORMATION METHOD, AND PRODUCTION METHOD OF METAL-CONTAINING FILM FORMATION COMPOSITION | JSR株式会社 | 2023-04-20 | — | — | WO | disclosed |
| US-20230069221-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE | JSR CORPORATION (JP) | 2023-03-02 | — | — | US | disclosed |
| WO-2023008149-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2023-02-02 | — | — | WO | disclosed |
| US-20220204535-A1 | COMPOSITION, FILM, METHOD OF FORMING FILM, METHOD OF FORMING PATTERN, METHOD OF FORMING ORGANIC-UNDERLAYER-FILM REVERSE PATTERN, AND METHOD OF PRODUCING COMPOSITION | JSR CORPORATION (JP) | 2022-06-30 | — | — | US | disclosed |
| WO-2021215240-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION AND SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD | JSR株式会社 (JP) | 2021-10-28 | — | — | WO | disclosed |
| US-20210318619-A1 | COMPOSITION, METHOD OF PRODUCING SUBSTRATE, METHOD OF FORMING PATTERN, AND METHOD OF FORMING REVERSE PATTERN | JSR CORPORATION (JP) | 2021-10-14 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| EP-2503392-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2012-09-26 | — | — | EP | disclosed |
| US-20040009429-A1 | Positive-working photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-01-15 | — | — | US | disclosed |
| US-6589705-B1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-08 | — | — | US | disclosed |
| US-6479211-B1 | FOR FAR ULTRAVIOLET EXPOSURE, WHICH CAN FORM A HIGHLY PRECISE PATTERN USING LIGHT IN THE FAR ULTRAVIOLET REGION INCLUDING AN EXCIMER LASER RAY, PARTICULARLY, IN THE REGION OF 250 NM OR LESS | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-12 | — | — | US | disclosed |
| EP-1096319-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-0513580-B1 | Alpha-phenyl-acrylic acid derivatives, process for their preparation and their use as parasiticides and fungicides | BASF AG (DE) | 1996-10-23 | — | — | EP | disclosed |
| US-5416068-A | Alpha-phenylacrylic acid derivatives, their preparation and their use for controlling pests and harmful fungi | BASF AKTIENGESELLSCHAFT (DE) | 1995-05-16 | — | — | US | disclosed |
| US-5298527-A | Insecticides | BASF AKTIENGESELLSCHAFT (DE) | 1994-03-29 | — | — | US | disclosed |
| EP-0513580-A2 | Alpha-phenyl-acrylic acid derivatives, process for their preparation and their use as parasiticides and fungicides | BASF Aktiengesellschaft (DE) | 1992-11-19 | — | — | EP | disclosed |