Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trimethyl Phosphate SCHEMBL19941 | 0.84 | — | — | |
| Trimethyl Phosphate SCHEMBL7624809 | 0.81 | — | — | |
| Trimethyl Phosphate SCHEMBL4250452 | 0.81 | — | — | |
| Trimethyl Phosphate SCHEMBL31009005 | 0.81 | — | — | |
| Trimethyl Phosphate SCHEMBL298751 | 0.81 | — | — | |
| Trimethyl Phosphate SCHEMBL2356985 | 0.81 | — | — | |
| Trimethyl Phosphate SCHEMBL7705188 | 0.81 | — | — | |
| Trimethyl Phosphate SCHEMBL2356992 | 0.81 | — | — | |
| Trimethyl Phosphate SCHEMBL5191073 | 0.81 | — | — | |
| Trimethyl Phosphate SCHEMBL31346647 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0940724-B1 | Use of a solution for developing a photosensitive polyimide precursor, and method of patterning | HITACHI CHEM DUPONT MICROSYS (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-6146815-A | Developer for photosensitive polyimide precursor, and method of using it for patterning | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. (US) | 2000-11-14 | — | — | US | disclosed |
| EP-0940724-A2 | Developer for photosensitive polyimide precursor, and method of using it for patterning | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 1999-09-08 | — | — | EP | disclosed |