⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2767294 | 0.79 | — | — | |
| SCHEMBL11264766 | 0.77 | — | — | |
| SCHEMBL3826644 | 0.77 | — | — | |
| SCHEMBL11056868 | 0.74 | — | — | |
| SCHEMBL5932657 | 0.72 | — | — | |
| SCHEMBL1376475 | 0.69 | — | — | |
| SCHEMBL18265848 | 0.69 | — | — | |
| SCHEMBL10395672 | 0.67 | — | — | |
| SCHEMBL21806654 | 0.64 | — | — | |
| SCHEMBL21806665 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0177793-B1 | PROCESS FOR PREPARING POLYAMIDES | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1990-11-28 | — | — | EP | claimed |
| US-4645823-A | CORROSION RESISTANCE; NONTOXIC | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1987-02-24 | — | — | US | claimed |
| EP-0177793-A2 | Process for preparing polyamides | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1986-04-16 | — | — | EP | claimed |
| US-20260036904-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-02-05 | — | — | US | disclosed |
| CN-120129875-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2025-06-10 | — | — | CN | disclosed |
| US-12312601-B2 | Culture substrate, method for manufacturing culture substrate, and culturing method and culturing device for stem cell | KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION (JP) | 2025-05-27 | — | — | US | disclosed |
| CN-118676106-A | Semiconductor device and method for manufacturing the same | 旭化成株式会社 | 2024-09-20 | — | — | CN | disclosed |
| CN-118448385-A | Semiconductor device and method for manufacturing the same | 旭化成株式会社 | 2024-08-06 | — | — | CN | disclosed |
| CN-118448386-A | Semiconductor device and method for manufacturing the same | 旭化成株式会社 | 2024-08-06 | — | — | CN | disclosed |
| WO-2024090486-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE | 旭化成株式会社 | 2024-05-02 | — | — | WO | disclosed |
| CN-111384021-B | Semiconductor device and method for manufacturing the same | 旭化成株式会社 | 2024-04-16 | — | — | CN | disclosed |
| CN-111384021-A | Semiconductor device and method for manufacturing the same | 旭化成株式会社 | 2020-07-07 | — | — | CN | disclosed |
| WO-2019176867-A1 | CULTURE SUBSTRATE, METHOD FOR MANUFACTURING CULTURE SUBSTRATE, AND CULTURING METHOD AND CULTURING DEVICE FOR STEM CELL | 国立大学法人九州大学 | 2019-09-19 | — | — | WO | disclosed |
| CN-110088680-A | The double-deck photosensitive layer volume | 旭化成株式会社 | 2019-08-02 | — | — | CN | disclosed |
| US-20150247126-A1 | METHOD OF CULTURING INDUCED PLURIPOTENT STEM CELL AND MATERIAL FOR CULTURING THE SAME | NATIONAL UNIVERSITY CORPORATION KYUSHU UNIVERSITY (JP) | 2015-09-03 | — | — | US | disclosed |
| EP-1219662-B1 | POLYAMIC ACID ESTER | ASAHI CHEMICAL IND (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-6610815-B1 | Photomask; pyromellitic acid and oxydiphthalic acid monomers | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2003-08-26 | — | — | US | disclosed |
| EP-1219662-A1 | POLYAMIC ACID ESTER | Asahi Kasei Kabushiki Kaisha (JP) | 2002-07-03 | — | — | EP | disclosed |
| US-5648451-A | Process for producing photosensitive resin | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1997-07-15 | — | — | US | disclosed |
| US-4645823-A | CORROSION RESISTANCE; NONTOXIC | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1987-02-24 | — | — | US | disclosed |