Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1270242 | 0.97 | TSHR (0.38) | TSHRTDP1 | |
| Acrylic Acid Methyl Ester SCHEMBL9016162 | 0.87 | TSHR (0.42) | TSHRTDP1 | |
| SCHEMBL7932649 | 0.86 | TSHR (0.39) | TSHRTDP1 | |
| Propylene Glycol SCHEMBL1255055 | 0.85 | TSHR (0.44) | TSHRTDP1 | |
| Acrylic Acid Methyl Ester SCHEMBL27285949 | 0.84 | TSHR (0.40) | TSHRTDP1 | |
| Acrylic Acid SCHEMBL5171540 | 0.82 | TDP1 (0.39) | TSHRTDP1 | |
| Acrylic Acid SCHEMBL29710638 | 0.82 | TDP1 (0.39) | TSHRTDP1 | |
| Acrylic Acid SCHEMBL30540377 | 0.82 | TDP1 (0.39) | TSHRTDP1 | |
| Acrylic Acid SCHEMBL181995 | 0.82 | TDP1 (0.39) | TSHRTDP1 | |
| Acrylic Acid SCHEMBL4636281 | 0.82 | TDP1 (0.39) | TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1387384-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | Hitachi Chemical Co., Ltd. (JP) | 2004-02-04 | — | — | EP | disclosed |
| EP-0768573-B1 | Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel | HITACHI CHEMICAL CO LTD (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-20030090193-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | NOJIRI TAKESHI (JP) | 2003-05-15 | — | — | US | disclosed |
| US-6416931-B2 | WHEREIN LOWERING OF BRIGHTNESS IS SUPPRESSED IN A PLASMA DISPLAY PANEL | HITACHI CHEMICAL CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| US-20020018946-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | NOJIRI TAKESHI (JP) | 2002-02-14 | — | — | US | disclosed |
| US-6329111-B1 | UNIFORM THICKNESS AND SHAPE ON THE WALL SURFACE OF A BARRIER RIB AND THE BOTTOM OF THE SPACE; SUBSTRATE HAS UNEVENNESS AND PHOSPHOR LAYER FORMED ON THE INNER SURFACE OF CONCAVE PORTION; FLAT PLATE MULTICOLOR PLASMA DISPLAY PANEL | HITACHI CHEMICAL COMPANY (JP) | 2001-12-11 | — | — | US | disclosed |
| US-6248501-B1 | RESINS WITH CARBOXY GROUPS AND ETHYLENEIC UNSATURATED COMPOUNDS | HITACHI CHEMICAL CO., LTD. (JP) | 2001-06-19 | — | — | US | disclosed |
| US-6077647-A | BACK PLATE FOR PLASMA DISPLAY PANEL | HITACHI CHEMICAL CO., LTD. (JP) | 2000-06-20 | — | — | US | disclosed |
| US-5858616-A | Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0785565-A1 | Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same | Hitachi Chemical Co., Ltd. (JP) | 1997-07-23 | — | — | EP | disclosed |
| EP-0768573-A1 | Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel | Hitachi Chemical Co., Ltd. (JP) | 1997-04-16 | — | — | EP | disclosed |