SCHEMBL6833634

SCHEMBL6833634

CN(C)CCN(C)C.[Ru]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4658729 0.94
SCHEMBL15334 0.94
SCHEMBL10425918 0.94 CA12 (0.73)
SCHEMBL11751856 0.89
SCHEMBL2327529 0.89
Lithium SCHEMBL9070605 0.89 CA12 (0.67)
SCHEMBL11807667 0.89
SCHEMBL6128088 0.89
Water SCHEMBL20492244 0.89
Ammonia Solution, Strong SCHEMBL110664 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6743934-B2 SUCH AS BIS(6-METHYL-2,4-HEPTANEDIONATE)(1,5-CYCLOOCTADIENE) RUTHENIUM TANAKA KIKINZOKU KOGYO K.K. (JP) 2004-06-01 US disclosed
US-20030203102-A1 Raw material compounds for use in CVD, and chemical vapor depsoition of ruthenium compound thin films TANAKA KIKINZOKU KOGYO K.K. (JP) 2003-10-30 US disclosed