SCHEMBL683642

SCHEMBL683642

CCC(C)c1ccc(OC(C)OCCOCc2c3ccccc3cc3ccccc23)cc1

nearest known ligand 0.37

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SLC7A5 Q01650 1/20 0.37
ALDH1A1 P00352 4/20 0.33
TSHR P16473 1/20 0.33
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
HTR2A P28223 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
GAA P10253 1/20 0.30
MAPT P10636 1/20 0.30
NPC1 O15118 1/20 0.30
RAB9A P51151 1/20 0.30
LTB4R Q15722 1/20 0.30
LTB4R2 Q9NPC1 1/20 0.30
PPARG P37231 1/20 0.30
PPARA Q07869 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10182886 0.89 SLC7A5 (0.41) SLC7A5ALDH1A1TSHRMEN1KMT2A
SCHEMBL3321998 0.86 CYP1A2 (0.35) KMT2ATDP1HTR2AL3MBTL1MAPT
SCHEMBL2758480 0.84 SLC7A5 (0.37) SLC7A5ALDH1A1MEN1KMT2ANPC1
SCHEMBL2758486 0.84 SLC7A5 (0.39) SLC7A5ALDH1A1TSHRMEN1KMT2A
SCHEMBL11922878 0.84 SLC7A5 (0.39) SLC7A5ALDH1A1TSHRMEN1KMT2A
SCHEMBL2758482 0.84 SLC7A5 (0.39) SLC7A5TDP1HTR2AL3MBTL1NPC1
SCHEMBL13163604 0.80
SCHEMBL2758494 0.80 SLC7A5 (0.37) SLC7A5ALDH1A1TSHRMEN1KMT2A
SCHEMBL2758492 0.80 SLC7A5 (0.37) SLC7A5ALDH1A1TSHRMEN1KMT2A
SCHEMBL2758493 0.80 SLC7A5 (0.37) SLC7A5ALDH1A1TSHRMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120003585-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed