Tetramethylammonium Ion

Tetramethylammonium Ion

SCHEMBL6838035

C=Cc1ccc(S(=O)(=O)[O-])cc1.C[N+](C)(C)C

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 2/20 0.55
▸ ALDH1A1 P00352 3/20 0.46
▸ LMNA P02545 3/20 0.36
▸ TSHR P16473 2/20 0.36
▸ HDAC8 Q9BY41 2/20 0.35
▸ PTGS2 P35354 4/20 0.33
▸ MAPK1 P28482 2/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ CYP2D6 P10635 1/20 0.33
▸ THPO P40225 1/20 0.33
▸ CHRNB2 P17787 1/20 0.33
▸ CHRNB4 P30926 1/20 0.33
▸ CHRNA3 P32297 1/20 0.33
▸ CHRNA7 P36544 1/20 0.33
▸ CHRNA4 P43681 1/20 0.33
▸ HCRTR1 O43613 1/20 0.32
▸ HCRTR2 O43614 1/20 0.32
▸ NPC1 O15118 1/20 0.31
▸ TP53 P04637 1/20 0.31
▸ MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Lithium Ion SCHEMBL31013166 0.89 TDP1 (0.61) TDP1ALDH1A1LMNATSHRHDAC8
Potassium Ion SCHEMBL331671 0.89 TDP1 (0.61) TDP1ALDH1A1LMNATSHRHDAC8
Lithium Ion SCHEMBL813502 0.89 TDP1 (0.61) TDP1ALDH1A1LMNATSHRHDAC8
SCHEMBL2025169 0.89 TDP1 (0.61) TDP1ALDH1A1LMNATSHRHDAC8
SCHEMBL94887 0.89 TDP1 (0.61) TDP1ALDH1A1LMNATSHRHDAC8
SCHEMBL2023060 0.89 TDP1 (0.61) TDP1ALDH1A1LMNATSHRHDAC8
SCHEMBL2024117 0.89 TDP1 (0.61) TDP1ALDH1A1LMNATSHRHDAC8
SCHEMBL17476623 0.89 TDP1 (0.61) TDP1ALDH1A1LMNATSHRHDAC8
SCHEMBL19915134 0.89 TDP1 (0.61) TDP1ALDH1A1LMNATSHRHDAC8
SCHEMBL5621482 0.89 TDP1 (0.61) TDP1ALDH1A1LMNATSHRHDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040029047-A1 Micropattern forming material, micropattern forming method and method for manufacturing semiconductor device RENESAS TECHNOLOGY CORP. (JP) 2004-02-12 — — US claimed
US-20040029047-A1 Micropattern forming material, micropattern forming method and method for manufacturing semiconductor device RENESAS TECHNOLOGY CORP. (JP) 2004-02-12 — — US disclosed
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