SCHEMBL6841507

SCHEMBL6841507

C=CC[C](F)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21159757 0.75
SCHEMBL3367618 0.73
SCHEMBL28250963 0.72
SCHEMBL6215728 0.72
Hypochlorous Acid SCHEMBL28791242 0.70
SCHEMBL235178 0.69
SCHEMBL678068 0.69
SCHEMBL28190423 0.67
SCHEMBL251832 0.67
SCHEMBL9786703 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6689203-B2 PYROLYSIS OF A CHLORINATED ORGANOTIN DERIVATIVE AND A POLY-FLUORO- AND/OR A HALO POLYFLUOROALKANE; CONTACTING THE VAPOR PHASE WITH A HOT SUBSTRATE; THIN FILMS; NONTOXIC; POLLUTION CONTROL; VISIBLE LIGHT TRANSMISSION; GLASS SUBSTRATE MERIENNE GILLES (FR) 2004-02-10 US disclosed
US-20030035890-A1 Liquid coating composition for production of fluorine doped tin oxide thin layers suitable for chemical vapor deposition process MERIENNE GILLES (FR) 2003-02-20 US disclosed
EP-1099006-B1 LIQUID PRECURSOR FOR CHEMICAL VAPOR DEPOSITION MERIENNE GILLES (FR) 2003-01-15 EP disclosed
EP-1099006-A1 LIQUID PRECURSOR FOR CHEMICAL VAPOR DEPOSITION Merienne, Gilles (FR) 2001-05-16 EP disclosed
WO-2000003063-A1 LIQUID PRECURSOR FOR CHEMICAL VAPOR DEPOSITION MERIENNE GILLES (FR) 2000-01-20 WO disclosed