⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL722777 | 0.72 | — | — | |
| SCHEMBL6052975 | 0.72 | — | — | |
| SCHEMBL10770048 | 0.72 | — | — | |
| SCHEMBL9445653 | 0.69 | — | — | |
| Ammonia Solution, Strong SCHEMBL3855127 | 0.69 | — | — | |
| Hydrogen Sulfide SCHEMBL11883412 | 0.69 | — | — | |
| SCHEMBL8678360 | 0.69 | — | — | |
| SCHEMBL10295068 | 0.67 | — | — | |
| SCHEMBL14571990 | 0.67 | — | — | |
| SCHEMBL3757187 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1315775-C | Method for producing 2,2,2-trifluoroethanol | TOSOH F TECH INC (JP) | 2007-05-16 | — | — | CN | disclosed |
| CN-1286788-C | Method for producing 2,2, 2-trifluoroethanol | TOSOH F TECH INC (JP) | 2006-11-29 | — | — | CN | disclosed |
| CN-1736973-A | Method for producing 2,2,2-trifluoroethanol | TOSOH F TECH INC (JP) | 2006-02-22 | — | — | CN | disclosed |
| US-6689203-B2 | PYROLYSIS OF A CHLORINATED ORGANOTIN DERIVATIVE AND A POLY-FLUORO- AND/OR A HALO POLYFLUOROALKANE; CONTACTING THE VAPOR PHASE WITH A HOT SUBSTRATE; THIN FILMS; NONTOXIC; POLLUTION CONTROL; VISIBLE LIGHT TRANSMISSION; GLASS SUBSTRATE | MERIENNE GILLES (FR) | 2004-02-10 | — | — | US | disclosed |
| US-20030035890-A1 | Liquid coating composition for production of fluorine doped tin oxide thin layers suitable for chemical vapor deposition process | MERIENNE GILLES (FR) | 2003-02-20 | — | — | US | disclosed |
| EP-1099006-B1 | LIQUID PRECURSOR FOR CHEMICAL VAPOR DEPOSITION | MERIENNE GILLES (FR) | 2003-01-15 | — | — | EP | disclosed |
| EP-1099006-A1 | LIQUID PRECURSOR FOR CHEMICAL VAPOR DEPOSITION | Merienne, Gilles (FR) | 2001-05-16 | — | — | EP | disclosed |
| WO-2000003063-A1 | LIQUID PRECURSOR FOR CHEMICAL VAPOR DEPOSITION | MERIENNE GILLES (FR) | 2000-01-20 | — | — | WO | disclosed |
| CN-1055356-A | NITROENAMINE DERIVATIVES | CIBA GEIGY AG (CH) | 1991-10-16 | — | — | CN | disclosed |