SCHEMBL6841816

SCHEMBL6841816

C[Si](O)(O)CC[Si](C)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12677815 0.88
SCHEMBL970150 0.82
SCHEMBL13254747 0.79 HDAC3 (0.41)
SCHEMBL17539032 0.77
SCHEMBL11273400 0.76
SCHEMBL19861680 0.76
SCHEMBL12677814 0.73 HDAC3 (0.31)
SCHEMBL6841033 0.73
SCHEMBL28033411 0.73
SCHEMBL15107772 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6764807-B2 LITHOGRAPHY KODAK POLYCHROME GRAPHICS LLC 2004-07-20 US disclosed
US-20020086235-A1 Lithography EASTMAN KODAK COMPANY 2002-07-04 US disclosed
US-6399271-B1 HYDROXY CONTAINING COMPOUND WITH AFFINITY FOR INK, AND TITANIUM OR SILICON CONTAINING COMPOUND WITH DIFFERENT AFFINITY FOR INK KODAK POLYCHROME GRAPHICS LLC 2002-06-04 US disclosed
EP-0377175-A2 Pattern forming composition and process for forming pattern using the same HITACHI, LTD. (JP) 1990-07-11 EP disclosed