⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11100893 | 0.82 | — | — | |
| SCHEMBL731565 | 0.82 | — | — | |
| SCHEMBL10397058 | 0.76 | — | — | |
| SCHEMBL4509732 | 0.73 | — | — | |
| SCHEMBL12330903 | 0.73 | — | — | |
| SCHEMBL13336386 | 0.73 | — | — | |
| SCHEMBL13451951 | 0.73 | — | — | |
| SCHEMBL13451997 | 0.73 | — | — | |
| SCHEMBL3680431 | 0.71 | — | — | |
| SCHEMBL6912267 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6770417-B2 | A NEGATIVE RESIST COMPOSITION COMPRISING A CONSTITUENT COMPONENT WHICH HAS A VINYL ETHER STRUCTURE PROTECTED WITH AN ACETAL IN A MOLECULE IS A FILM FORMING POLYMER SOLUBLE IN BASIC SOLUTION AND HAS AN ALKALI SOLUBLE GROUP | FUJITSU LIMITED (JP) | 2004-08-03 | — | — | US | disclosed |
| US-20020058197-A1 | Negative resist composition, process for forming resist patterns, and process for manufacturing electron device | FUJITSU LIMITED | 2002-05-16 | — | — | US | disclosed |
| EP-1184723-A2 | Negative resist composition, process for forming resist patterns, and process for manufacturing electronic device | FUJITSU LIMITED (JP) | 2002-03-06 | — | — | EP | disclosed |