SCHEMBL685230

SCHEMBL685230

C[Si](C)(C)N[SiH2]N[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17689142 0.70
SCHEMBL29216776 0.67
SCHEMBL30713279 0.62
SCHEMBL7599387 0.60
Hydrochloric Acid SCHEMBL4262029 0.57
SCHEMBL49675 0.53
SCHEMBL4964921 0.53
SCHEMBL7649 0.53
SCHEMBL453764 0.53
SCHEMBL17432695 0.52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 197 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12628578-B2 Substrate processing method ASM IP HOLDING B.V. (NL) 2026-05-12 US claimed
US-12546000-B2 Substrate processing method ASM IP HOLDING B.V. (NL) 2026-02-10 US claimed
US-20260002264-A1 SUBSTRATE PROCESSING METHOD ASM IP HOLDING BV (NL) 2026-01-01 US claimed
US-20250313953-A1 METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS ASM IP HOLDING B.V. (NL) 2025-10-09 US claimed
US-12378667-B2 Methods and systems for forming doped silicon nitride films ASM IP HOLDING B.V. (NL) 2025-08-05 US claimed
CN-113493906-B Method for forming thin film ASM IP私人控股有限公司 2025-06-10 CN claimed
CN-120015619-A Substrate processing method ASM IP私人控股有限公司 2025-05-16 CN claimed
US-20250157811-A1 SUBSTRATE PROCESSING METHOD ASM IP HOLDING B.V. (NL) 2025-05-15 US claimed
CN-119843246-A Substrate processing method ASM IP私人控股有限公司 2025-04-18 CN claimed
US-20250122617-A1 SUBSTRATE PROCESSING METHOD ASM IP HOLDING B.V. (NL) 2025-04-17 US claimed
US-20230089397-A1 AIR GAP FORMING METHOD AND SELECTIVE DEPOSITION METHOD ASM IP HOLDING B.V. (NL) 2023-03-23 US claimed
CN-115807217-A Air gap forming method and selective deposition method ASM IP私人控股有限公司 2023-03-17 CN claimed
US-20230070340-A1 METHOD FOR SEASONING A CHAMBER ASM IP HOLDING B.V. (NL) 2023-03-09 US claimed
CN-114622183-A Method for preparing silicon oxide film 湖南红太阳光电科技有限公司 2022-06-14 CN claimed
JP-2010539730-A 2010-12-16 JP claimed
EP-2193541-A1 METHOD OF FORMING SILICON-CONTAINING FILMS L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2010-06-09 EP claimed
US-7709632-B2 such as porphyrins, chlorins, texaphyrins via cyclization, oligomerization JOHNSON THOMAS E 2010-05-04 US claimed
US-20090232985-A1 METHOD OF FORMING SILICON OXIDE CONTAINING FILMS L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2009-09-17 US claimed
WO-2009039251-A1 METHOD OF FORMING SILICON-CONTAINING FILMS L'AIR LIQUIDE - SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2009-03-26 WO claimed
US-20090075490-A1 METHOD OF FORMING SILICON-CONTAINING FILMS L'AIR LIQUITE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2009-03-19 US claimed