SCHEMBL6859000

SCHEMBL6859000

CO[Si](OC)(OC)C1([SiH3])CCCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27447163 0.83
SCHEMBL28986382 0.79
SCHEMBL4448996 0.78
Methane SCHEMBL10320030 0.76
SCHEMBL28132668 0.76
SCHEMBL28951683 0.74
SCHEMBL15227902 0.73
SCHEMBL28049267 0.72
SCHEMBL28229288 0.72
SCHEMBL4370009 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110248892-B Macroscopic formation of carbon nanotubes by gas phase treatment 耶路撒冷希伯来大学伊森姆研究发展有限公司 2023-08-04 CN disclosed
CN-115966659-A Composite material for secondary lithium battery and preparation method and application thereof 溧阳天目先导电池材料科技有限公司 2023-04-14 CN disclosed
US-6790904-B2 RESIN CONTAINING PARTICLES HAVE BEEN CHEMICALLY MODIFIED TO HAVE A SURFACE TENSION LOWER THAN THAT OF THE FILM-FORMING RESIN AS CURED WITHOUT PARTICLES; IMPROVED MAR AND SCRATCH RESISTANCE PPG INDUSTRIES OHIO, INC. 2004-09-14 US disclosed
US-5567764-A CONTAINING AT LEAST ONE ORGANOHYDROGENSILICON COMPOUND AND A PLATINUM GROUP METAL-CONTAINING CATALYST DOW CORNING CORPORATION (US) 1996-10-22 US disclosed