Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Nitric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA5A | P35218 | 1/20 | 0.57 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.57 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | CPA1 | P15085 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Nitric Acid SCHEMBL11013793 | 1.00 | — | — | |
| Nitric Acid SCHEMBL11750617 | 0.97 | — | — | |
| Butadiene SCHEMBL2838475 | 0.81 | — | — | |
| Nitric Acid SCHEMBL1953156 | 0.81 | — | — | |
| Nitric Acid SCHEMBL31233720 | 0.81 | — | — | |
| Nitric Acid SCHEMBL11502145 | 0.79 | — | — | |
| Nitric Acid SCHEMBL29283670 | 0.79 | — | — | |
| Nitric Acid SCHEMBL7759153 | 0.79 | — | — | |
| Nitric Acid SCHEMBL1232080 | 0.79 | — | — | |
| Nitric Acid SCHEMBL29271573 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6743562-B2 | ACID GENERATORS; FOR THE PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS, PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-20020172886-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2002-11-21 | — | — | US | disclosed |