⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6859090 | 0.97 | — | — | |
| SCHEMBL4578751 | 0.97 | — | — | |
| SCHEMBL14686463 | 0.97 | — | — | |
| SCHEMBL14719325 | 0.97 | — | — | |
| SCHEMBL14686478 | 0.97 | — | — | |
| SCHEMBL14686447 | 0.97 | — | — | |
| SCHEMBL14688380 | 0.97 | — | — | |
| SCHEMBL14686544 | 0.97 | — | — | |
| SCHEMBL14688381 | 0.97 | — | — | |
| SCHEMBL14691721 | 0.97 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0624166-B1 | POLYMERIZABLE CARBOHYDRATE ESTERS, POLYMERS MADE FROM SUCH ESTERS AND THE USE OF SUCH POLYMERS | CIBA GEIGY AG (CH) | 1997-04-16 | — | — | EP | claimed |
| US-5571882-A | CONTACT LENSES | CIBA-GEIBY CORPORATION (US) | 1996-11-05 | — | — | US | claimed |
| EP-0624166-A1 | POLYMERIZABLE CARBOHYDRATE ESTERS, POLYMERS MADE FROM SUCH ESTERS AND THE USE OF SUCH POLYMERS. | CIBA GEIGY AG (CH) | 1994-11-17 | — | — | EP | claimed |
| WO-1994012540-A1 | POLYMERIZABLE CARBOHYDRATE ESTERS, POLYMERS MADE FROM SUCH ESTERS AND THE USE OF SUCH POLYMERS | CIBA-GEIGY AG (CH) | 1994-06-09 | — | — | WO | claimed |
| US-8802352-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-08-12 | — | — | US | disclosed |
| US-8741544-B2 | Salt, photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-20130052588-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130040239-A1 | SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-14 | — | — | US | disclosed |
| US-6794530-B1 | 1,4-ADDITION OF MONOHYDRIC OR POLYHYDRIC ALCOHOLS TO ALPHA , BETA -UNSATURATED NITRILES | BASF AKTIENGESELLSCHAFT (DE) | 2004-09-21 | — | — | US | disclosed |
| EP-0934925-B1 | Process for the preparation of beta-alkoxy nitriles | BASF AG (DE) | 2002-09-25 | — | — | EP | disclosed |
| EP-0934925-A1 | Process for the preparation of beta-alkoxy nitriles | BASF AKTIENGESELLSCHAFT (DE) | 1999-08-11 | — | — | EP | disclosed |
| EP-0624166-B1 | POLYMERIZABLE CARBOHYDRATE ESTERS, POLYMERS MADE FROM SUCH ESTERS AND THE USE OF SUCH POLYMERS | CIBA GEIGY AG (CH) | 1997-04-16 | — | — | EP | disclosed |
| US-5571882-A | CONTACT LENSES | CIBA-GEIBY CORPORATION (US) | 1996-11-05 | — | — | US | disclosed |
| US-5488102-A | MONOMERS FOR POLYMERS FOR HYDROGELS FOR CONTACT LENSES AND SURFACTANTS | CIBA GEIGY CORPORATION (US) | 1996-01-30 | — | — | US | disclosed |
| EP-0624166-A1 | POLYMERIZABLE CARBOHYDRATE ESTERS, POLYMERS MADE FROM SUCH ESTERS AND THE USE OF SUCH POLYMERS. | CIBA GEIGY AG (CH) | 1994-11-17 | — | — | EP | disclosed |
| WO-1994012540-A1 | POLYMERIZABLE CARBOHYDRATE ESTERS, POLYMERS MADE FROM SUCH ESTERS AND THE USE OF SUCH POLYMERS | CIBA-GEIGY AG (CH) | 1994-06-09 | — | — | WO | disclosed |