⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL138011 | 0.83 | — | — | |
| SCHEMBL6860793 | 0.77 | — | — | |
| SCHEMBL2032710 | 0.73 | — | — | |
| SCHEMBL16236891 | 0.69 | — | — | |
| SCHEMBL11437302 | 0.69 | — | — | |
| SCHEMBL7987143 | 0.69 | — | — | |
| SCHEMBL1582928 | 0.67 | — | — | |
| SCHEMBL28285964 | 0.65 | — | — | |
| Alcohol SCHEMBL27767751 | 0.63 | — | — | |
| SCHEMBL3243336 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3705500-B1 | METHOD FOR MANUFACTURING 2-CYANOETHYL GROUP-CONTAINING POLYMER | LG CHEMICAL LTD (KR) | 2024-05-29 | — | — | EP | disclosed |
| US-20210054114-A1 | Method for Preparing 2-Cyanoethyl Group-Containing Polymer | LG CHEM, LTD. (KR) | 2021-02-25 | — | — | US | disclosed |
| EP-3705500-A1 | METHOD FOR MANUFACTURING 2-CYANOETHYL GROUP-CONTAINING POLYMER | LG CHEM, LTD. (KR) | 2020-09-09 | — | — | EP | disclosed |
| WO-2020022681-A1 | METHOD FOR MANUFACTURING 2-CYANOETHYL GROUP-CONTAINING POLYMER | 주식회사 엘지화학 | 2020-01-30 | — | — | WO | disclosed |
| US-9986341-B2 | Electroacoustic converter | FUJIFILM CORPORATION (JP) | 2018-05-29 | — | — | US | disclosed |
| US-20170019737-A1 | ELECTROACOUSTIC CONVERTER | FUJIFILM CORPORATION (JP) | 2017-01-19 | — | — | US | disclosed |
| US-6835889-B2 | Passive element component and substrate with built-in passive element | KABUSHIKI KAISHA TOSHIBA (JP) | 2004-12-28 | — | — | US | disclosed |
| US-20030107465-A1 | Passive element component and substrate with built-in passive element | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-06-12 | — | — | US | disclosed |
| US-5663778-A | Liquid crystal devices and method for making the same | ALPS ELECTRIC CO., LTD. (JP) | 1997-09-02 | — | — | US | disclosed |
| US-5490035-A | HIGH DIELECTRIC | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) | 1996-02-06 | — | — | US | disclosed |
| US-4027345-A | Transfer printing | TOYO BOSEKI KABUSHIKI KAISHA (JA) | 1977-06-07 | — | — | US | disclosed |