⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL980432 | 0.76 | — | — | |
| SCHEMBL7025326 | 0.76 | — | — | |
| SCHEMBL1242903 | 0.73 | — | — | |
| SCHEMBL1141891 | 0.70 | — | — | |
| SCHEMBL24445848 | 0.70 | — | — | |
| SCHEMBL19908650 | 0.70 | — | — | |
| SCHEMBL7865477 | 0.70 | — | — | |
| SCHEMBL981309 | 0.67 | — | — | |
| SCHEMBL7033089 | 0.67 | — | — | |
| SCHEMBL24869 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6800418-B2 | ALLOWING DEVELOPMENT WITH CONVENTIONAL DEVELOPERS AND HAVING A HIGH TRANSMITTANCE AT A F2 EXCIMER LASER WAVELENGTH OF 157 NM, HYDROPHILICITY, ADHESION TO UNDERLAYER | SAMSUNG ELECTRONICS (KR) | 2004-10-05 | — | — | US | claimed |
| US-20030157430-A1 | Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-08-21 | — | — | US | claimed |
| WO-2002021216-A9 | POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING ELECTRONEGATIVE GROUPS | SHIPLEY CO LLC (US) | 2003-04-03 | — | — | WO | claimed |
| US-20020058199-A1 | Novel polymers and photoresist compositions comprising electronegative groups | SHIPLEY COMPANY, L.L.C. | 2002-05-16 | — | — | US | claimed |
| WO-2002021216-A2 | POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING ELECTRONEGATIVE GROUPS | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-14 | — | — | WO | claimed |
| US-6800418-B2 | ALLOWING DEVELOPMENT WITH CONVENTIONAL DEVELOPERS AND HAVING A HIGH TRANSMITTANCE AT A F2 EXCIMER LASER WAVELENGTH OF 157 NM, HYDROPHILICITY, ADHESION TO UNDERLAYER | SAMSUNG ELECTRONICS (KR) | 2004-10-05 | — | — | US | disclosed |
| US-20030157430-A1 | Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-08-21 | — | — | US | disclosed |