SCHEMBL6865283

SCHEMBL6865283

O=C(O)CCCC12CC3CC(CC(C3)C1)C2.O=C(O)CCCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.52

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 3/20 0.52
GRIN3B O60391 3/20 0.52
GRIN1 Q05586 3/20 0.52
GRIN2A Q12879 3/20 0.52
GRIN2B Q13224 3/20 0.52
GRIN2C Q14957 3/20 0.52
GRIN3A Q8TCU5 3/20 0.52
EPHX2 P34913 7/20 0.50
ALOX5 P09917 1/20 0.47
ALDH1A1 P00352 3/20 0.46
KDM4E B2RXH2 1/20 0.46
HTT P42858 1/20 0.46
GRM2 Q14416 1/20 0.45
GRM3 Q14832 1/20 0.45
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
TSHR P16473 1/20 0.42
POLB P06746 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6159216 1.00 GRIN2D (0.52) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL1758579 0.94 GRIN2D (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL6864625 0.94 GRIN2D (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL10756954 0.92 EPHX2 (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL9242092 0.92 EPHX2 (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL6046118 0.92 EPHX2 (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL11030815 0.92 EPHX2 (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL10760637 0.92 EPHX2 (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL10757410 0.92 EPHX2 (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL27033177 0.92 EPHX2 (0.53) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6803170-B2 MIXTURE CONTAINING ACID GENERATOR SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) 2004-10-12 US claimed
EP-1179749-B1 Resist composition and method for manufacturing semiconductor device using the resist composition SEMICONDUCTOR LEADING EDGE TEC (JP) 2003-10-08 EP claimed
US-20020022193-A1 Resist composition and method for manufacturing semiconductor device using the resist composition SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. 2002-02-21 US claimed
EP-1179749-A1 Resist composition and method for manufacturing semiconductor device using the resist composition Semiconductor Leading Edge Technologies, Inc. (JP) 2002-02-13 EP claimed
US-6803170-B2 MIXTURE CONTAINING ACID GENERATOR SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) 2004-10-12 US disclosed
EP-1179749-B1 Resist composition and method for manufacturing semiconductor device using the resist composition SEMICONDUCTOR LEADING EDGE TEC (JP) 2003-10-08 EP disclosed
US-20020022193-A1 Resist composition and method for manufacturing semiconductor device using the resist composition SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. 2002-02-21 US disclosed
EP-1179749-A1 Resist composition and method for manufacturing semiconductor device using the resist composition Semiconductor Leading Edge Technologies, Inc. (JP) 2002-02-13 EP disclosed