SCHEMBL6877683

SCHEMBL6877683

CC1=CC(C)C([Zr](C2=C(C)C=C(C)C2)=[Si](C)C)=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL8179047 0.98
SCHEMBL8167835 0.76
Hydrochloric Acid SCHEMBL7643974 0.75
SCHEMBL6576817 0.70
SCHEMBL16239513 0.70
Hydrochloric Acid SCHEMBL16239585 0.69
SCHEMBL2805130 0.66
SCHEMBL6554391 0.64 TSHR (0.42)
SCHEMBL7945982 0.62
SCHEMBL7941473 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6825280-B1 RIGIDITY, NONWARPING, NONBLEEDING, ANTISTATIC AGENTS, WEATHERPROOF, IMPACT STRENGTH; OXIDATION AND HEAT RESISTANCE JAPAN POLYCHEM CORPORATION (JP) 2004-11-30 US disclosed
US-6201069-B1 POLYPROPYLENE AND ETHYLENE-PROPYLENE COPOLYMER BLENDS CHISSO CORPORATION (JP) 2001-03-13 US disclosed
EP-1002814-A1 PROPYLENE BLOCK COPOLYMER AND PROPYLENE RESIN COMPOSITION Japan Polychem Corporation (JP) 2000-05-24 EP disclosed
US-5623022-A VAPOR PHASE; USING COORDINATION CATALYST MITSUBISHI CHEMICAL CORPORATION (JP) 1997-04-22 US disclosed