SCHEMBL6880604

SCHEMBL6880604

COC(OCc1ccccc1)(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.71

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CES1 P23141 1/20 0.71
SLC6A2 P23975 1/20 0.44
SLC6A3 Q01959 1/20 0.44
KMT2A Q03164 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
SRC P12931 1/20 0.41
ALDH1A1 P00352 3/20 0.41
RAB9A P51151 3/20 0.41
NPC1 O15118 2/20 0.41
MAOB P27338 2/20 0.39
LMNA P02545 2/20 0.38
HPGD P15428 1/20 0.38
ATM Q13315 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
NR4A2 P43354 2/20 0.38
KCNN4 O15554 1/20 0.38
NR4A1 P22736 1/20 0.37
NR4A3 Q92570 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5598169 0.84 CES1 (0.75) CES1KMT2ASRCALDH1A1NPC1
SCHEMBL8208898 0.84 CES1 (0.81) CES1TDP1SRCALDH1A1RAB9A
SCHEMBL1679763 0.84 CES1 (1.00) CES1KMT2ATDP1SRCALDH1A1
SCHEMBL15173 0.84 CES1 (1.00) CES1KMT2ATDP1SRCALDH1A1
SCHEMBL15048635 0.83 CES1 (0.50) CES1SLC6A2SLC6A3KMT2ATDP1
Methoxymethane SCHEMBL28719477 0.82 CES1 (0.96) CES1KMT2ATDP1SRCALDH1A1
SCHEMBL14523014 0.82 CES1 (0.71) CES1KMT2ATDP1SRCALDH1A1
Alcohol SCHEMBL28270850 0.81 CES1 (0.86) CES1KMT2ATDP1SRCALDH1A1
Phenol SCHEMBL27461359 0.81 CES1 (0.86) CES1SLC6A2SLC6A3KMT2ATDP1
Formaldehyde SCHEMBL1128921 0.80 CES1 (0.93) CES1KMT2ATDP1SRCALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2697284-A1 LCST POLYMERS BASF SE (DE) 2014-02-19 EP disclosed
WO-2012140064-A1 PROCESS FOR PRODUCING COATINGS BASED ON LCST POLYMERS BASF SE (DE) 2012-10-18 WO disclosed
WO-2012140059-A1 LCST POLYMERS BASF SE (DE) 2012-10-18 WO disclosed
EP-0968501-B1 IMPREGNATING, CASTING AND COATING COMPOUNDS FOR ELECTROTECHNICAL AND/OR ELECTRONIC COMPONENTS AND FOR CARRIER MATERIALS FOR PLANE INSULATING MATERIALS ALTANA ELEC INSULATION GMBH (DE) 2004-04-28 EP disclosed
EP-0968501-A1 IMPREGNATING, CASTING AND COATING COMPOUNDS FOR ELECTROTECHNICAL AND/OR ELECTRONIC COMPONENTS AND FOR CARRIER MATERIALS FOR PLANE INSULATING MATERIALS Altana Electrical Insulation Gmbh (DE) 2000-01-05 EP disclosed
WO-1998041994-A1 IMPREGNATING, CASTING AND COATING COMPOUNDS FOR ELECTROTECHNICAL AND/OR ELECTRONIC COMPONENTS AND FOR CARRIER MATERIALS FOR PLANE INSULATING MATERIALS SCHENECTADY INTERNATIONAL, INC. (US) 1998-09-24 WO disclosed
EP-0736074-B1 RADIATION-CURABLE PROTECTIVE LACQUER, ESPECIALLY FOR METALLISED SURFACES BASF COATINGS AG (DE) 1998-01-28 EP disclosed
WO-1997025380-A1 LOW-SHRINKAGE CURABLE COATING MATERIALS WITH GOOD ADHESION TO METAL SUBSTRATES PPG INDUSTRIES INC. (US) 1997-07-17 WO disclosed
EP-0736074-A1 RADIATION-CURABLE PROTECTIVE LACQUER, ESPECIALLY FOR METALLISED SURFACES BASF Lacke + Farben AG (DE) 1996-10-09 EP disclosed
EP-0599069-B1 Light-sensitive recording material BASF LACKE & FARBEN (DE) 1995-12-27 EP disclosed
EP-0070510-A1 Process for the production of photopolymer intaglio printing forms BASF Aktiengesellschaft (DE) 1983-01-26 EP disclosed
EP-0054150-A1 Photopolymerisable recording material and process for the production of relief forms by means of this recording material BASF Aktiengesellschaft (DE) 1982-06-23 EP disclosed
EP-0054151-A1 Photopolymerisable recording material and process for the production of relief forms by means of this recording material BASF Aktiengesellschaft (DE) 1982-06-23 EP disclosed
EP-0053260-A1 Photosensible multilayer material and process for its production BASF Aktiengesellschaft (DE) 1982-06-09 EP disclosed
EP-0053259-A1 Photosensible multilayer material and process for the production of subbing layers therefor BASF Aktiengesellschaft (DE) 1982-06-09 EP disclosed
EP-0050224-A1 Photopolymeric relief forms and process for their production BASF Aktiengesellschaft (DE) 1982-04-28 EP disclosed
US-4287367-A Manufacture of symmetrical or unsymmetrical monoacetals of aromatic 1,2-diketones BASF AKTIENGESELLSCHAFT (DE) 1981-09-01 US disclosed
EP-0023634-A1 Process for producing shaped articles from unsaturated polyester resins BASF Aktiengesellschaft (DE) 1981-02-11 EP disclosed
US-4198241-A PHOTOINITIATOR, UNSATURATED MONOMER, POLYMERIC BINDER, ETHERIFIED THIOANTHRAQUINONE BASF AKTIENGESELLSCHAFT (DE) 1980-04-15 US disclosed
US-4144156-A Manufacture of unsymmetric monoacetals of aromatic 1,2-diketones employable as photoiniatiators BASF AKTIENGESELLSCHAFT (DE) 1979-03-13 US disclosed