Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRIM24 | O15164 | 2/20 | 0.38 |
| ▸ | TRIM33 | Q9UPN9 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | CASP1 | P29466 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8461483 | 1.00 | TRIM24 (0.38) | TRIM24TRIM33ALDH1A1TSHRCASP1 | |
| SCHEMBL19178735 | 1.00 | TRIM24 (0.38) | TRIM24TRIM33ALDH1A1TSHRCASP1 | |
| SCHEMBL1052903 | 1.00 | TRIM24 (0.38) | TRIM24TRIM33ALDH1A1TSHRCASP1 | |
| SCHEMBL19178734 | 1.00 | TRIM24 (0.38) | TRIM24TRIM33ALDH1A1TSHRCASP1 | |
| SCHEMBL19178733 | 1.00 | TRIM24 (0.38) | TRIM24TRIM33ALDH1A1TSHRCASP1 | |
| SCHEMBL151215 | 1.00 | — | — | |
| SCHEMBL8461479 | 1.00 | TRIM24 (0.38) | TRIM24TRIM33ALDH1A1TSHRCASP1 | |
| SCHEMBL8461939 | 1.00 | TRIM24 (0.38) | TRIM24TRIM33ALDH1A1TSHRCASP1 | |
| SCHEMBL8461935 | 1.00 | TRIM24 (0.38) | TRIM24TRIM33ALDH1A1TSHRCASP1 | |
| SCHEMBL28365053 | 1.00 | TRIM24 (0.38) | TRIM24TRIM33ALDH1A1TSHRCASP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6749671-B2 | Abatement of effluents from chemical vapor deposition processes using organometallic source reagents | ADVANCED TECHNOLOGY MATERIALS, INC. | 2004-06-15 | — | — | US | disclosed |
| US-20030136265-A1 | Abatement of effluents from chemical vapor deposition processes using organometallic source reagents | APPLIED MATERIALS, INC. | 2003-07-24 | — | — | US | disclosed |
| US-6537353-B2 | Contacting effluent with sorbent material having sorptive affinity for source reagent and decomposition products thereof to remove residual source reagent and decomposition products | ADVANCED TECHNOLOGY MATERIALS, INC. | 2003-03-25 | — | — | US | disclosed |
| CN-1379732-A | Abatement of effluents from chemical vapor deposition processes using organome tallicsource reagents | ADVANCED TECH MATERIALS (US) | 2002-11-13 | — | — | CN | disclosed |
| EP-1237815-A1 | ABATEMENT OF EFFLUENTS FROM CHEMICAL VAPOR DEPOSITION PROCESSES USING ORGANOMETALLICSOURCE REAGENTS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2002-09-11 | — | — | EP | disclosed |
| WO-2001028917-A9 | ABATEMENT OF EFFLUENTS FROM CHEMICAL VAPOR DEPOSITION PROCESSES USING ORGANOMETALLICSOURCE REAGENTS | ADVANCED TECH MATERIALS (US) | 2002-08-08 | — | — | WO | disclosed |
| US-20020094380-A1 | Abatement of effluents from chemical vapor deposition processes using organometallicsource reagents | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-07-18 | — | — | US | disclosed |
| US-6391385-B1 | USING SOURCE REAGENT HAVING A METAL ORGANIC LOOSELY BOUND TO AN ORGANIC OR ORGANOMETALLIC MOLECULE SUCH THAT UPON EXPOSURE TO HEAT SUCH BOND IS READILY CLEAVABLE | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-05-21 | — | — | US | disclosed |
| WO-2001028917-A1 | ABATEMENT OF EFFLUENTS FROM CHEMICAL VAPOR DEPOSITION PROCESSES USING ORGANOMETALLICSOURCE REAGENTS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2001-04-26 | — | — | WO | disclosed |