⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6333804 | 0.73 | — | — | |
| SCHEMBL20510137 | 0.73 | — | — | |
| SCHEMBL10493899 | 0.71 | — | — | |
| SCHEMBL3015509 | 0.69 | — | — | |
| SCHEMBL836316 | 0.67 | — | — | |
| SCHEMBL7410039 | 0.67 | — | — | |
| SCHEMBL214876 | 0.65 | — | — | |
| SCHEMBL9269603 | 0.65 | — | — | |
| SCHEMBL8179763 | 0.65 | — | — | |
| SCHEMBL262579 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6749671-B2 | Abatement of effluents from chemical vapor deposition processes using organometallic source reagents | ADVANCED TECHNOLOGY MATERIALS, INC. | 2004-06-15 | — | — | US | disclosed |
| US-20030136265-A1 | Abatement of effluents from chemical vapor deposition processes using organometallic source reagents | APPLIED MATERIALS, INC. | 2003-07-24 | — | — | US | disclosed |
| US-6537353-B2 | Contacting effluent with sorbent material having sorptive affinity for source reagent and decomposition products thereof to remove residual source reagent and decomposition products | ADVANCED TECHNOLOGY MATERIALS, INC. | 2003-03-25 | — | — | US | disclosed |
| CN-1379732-A | Abatement of effluents from chemical vapor deposition processes using organome tallicsource reagents | ADVANCED TECH MATERIALS (US) | 2002-11-13 | — | — | CN | disclosed |
| EP-1237815-A1 | ABATEMENT OF EFFLUENTS FROM CHEMICAL VAPOR DEPOSITION PROCESSES USING ORGANOMETALLICSOURCE REAGENTS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2002-09-11 | — | — | EP | disclosed |
| WO-2001028917-A9 | ABATEMENT OF EFFLUENTS FROM CHEMICAL VAPOR DEPOSITION PROCESSES USING ORGANOMETALLICSOURCE REAGENTS | ADVANCED TECH MATERIALS (US) | 2002-08-08 | — | — | WO | disclosed |
| US-20020094380-A1 | Abatement of effluents from chemical vapor deposition processes using organometallicsource reagents | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-07-18 | — | — | US | disclosed |
| US-6391385-B1 | USING SOURCE REAGENT HAVING A METAL ORGANIC LOOSELY BOUND TO AN ORGANIC OR ORGANOMETALLIC MOLECULE SUCH THAT UPON EXPOSURE TO HEAT SUCH BOND IS READILY CLEAVABLE | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-05-21 | — | — | US | disclosed |
| WO-2001028917-A1 | ABATEMENT OF EFFLUENTS FROM CHEMICAL VAPOR DEPOSITION PROCESSES USING ORGANOMETALLICSOURCE REAGENTS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2001-04-26 | — | — | WO | disclosed |