⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3120770 | 0.80 | — | — | |
| SCHEMBL3126230 | 0.76 | — | — | |
| SCHEMBL4445312 | 0.73 | — | — | |
| SCHEMBL311015 | 0.72 | — | — | |
| SCHEMBL8408706 | 0.72 | — | — | |
| SCHEMBL3126300 | 0.72 | — | — | |
| SCHEMBL2555079 | 0.71 | — | — | |
| SCHEMBL6141634 | 0.70 | — | — | |
| SCHEMBL2353911 | 0.69 | — | — | |
| SCHEMBL1208278 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101086618-B | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for elements production | CANON KK | 2012-06-20 | — | — | CN | disclosed |
| US-8129087-B2 | Block copolymer and substrate processing method | CANON KABUSHIKI KAISHA (JP) | 2012-03-06 | — | — | US | disclosed |
| US-7651834-B2 | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production | CANON KABUSHIKI KAISHA (JP) | 2010-01-26 | — | — | US | disclosed |
| US-20090311637-A1 | BLOCK COPOLYMER AND SUBSTRATE PROCESSING METHOD | CANON KABUSHIKI KAISHA (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20070287105-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION | CANON KABUSHIKI KAISHA (JP) | 2007-12-13 | — | — | US | disclosed |
| CN-101086618-A | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for elements production | CANON KK (JP) | 2007-12-12 | — | — | CN | disclosed |